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- Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author) other 2014
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- van der Walle, P. (author), Hannemann, S. (author), van Eijk, D. (author), Mulckhuyse, W.F.W. (author), van der Donck, J.C.J. (author) public lecture 2014
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van der Walle, P. (author), Hannemann, S. (author), van Eijk, D. (author), Mulckhuyse, W.F.W. (author), van der Donck, J.C.J. (author)The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner....conference paper 2014
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Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author)Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was...conference paper 2014
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Stortelder, J.K. (author), van der Donck, J.C.J. (author), Oostrom, S. (author), van der Walle, P. (author), Brux, O. (author), Dress, P. (author)Before new equipment for handling of EUV reticles can be used, it should be shown that the apparatus is qualified for operating at a sufficiently clean level. TNO developed a qualification procedure that is separated into two parts: reticle handling and transport qualification and the qualification of the equipment. A statistical method was...conference paper 2011