Searched for: subject%3A%22Peak%255C%2Brepulsive%255C%2BForce%22
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Keyvani Janbahan, A. (author), Sadeghian Marnani, H. (author), Goosen, H. (author), van Keulen, F. (author)
The maximum amount of repulsive force applied to the surface plays a very important role in damage of tip or sample in Atomic Force Microscopy(AFM). So far, many investigations have focused on peak repulsive forces in tapping mode AFM in steady state conditions. However, it is known that AFM could be more damaging in transient conditions. In...
conference paper 2015