Searched for: subject%3A%22NI%255C%2B%255C-%255C%2BNano%255C%2BInstrumentation%22
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Lesundak, A. (author), Voigt, D. (author), Cip, O. (author), van den Berg, S. (author)
Homodyne interferometry with a frequency comb as multi-wavelength source is a powerful method to measure long distances with high accuracy. The measurement principle requires that individual comb modes are spectrally resolved, making hundreds or thousands of accurately known wavelengths available for interferometry. For this reason the method...
article 2017
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Heo, J. (author), Xu, M. (author), Maas, D.J. (author)
Due to the rather broad band emission spectrum of the extremely hot plasma in its extreme ultra-violet (EUV) source, an EUV lithography scanner also projects out-of-band vacuum- and deep-UV (OoB V/DUV) light on the photoresist on a wafer. As this type of uncontrolled and undesirable light can activate resist chemistry, it will impair the...
article 2017
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Molkenboer, F.T. (author)
EBL2 is not a setup for producing semiconductor devices. The experiments for which EBL2 is intended are: accelerated lifetime tests for EUV Mirrors; EUV Reticles and pellicles; and Materials used in EUV lithography. This kind of research is needed due to the harsh EUV environment, and EUV lithography is coming to market. EBL2 is able to...
public lecture 2017
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Gül, O. (author), Zhang, H. (author), de Vries, F.K. (author), van Veen, J. (author), Zuo, K. (author), Mourik, V. (author), Conesa-Boj, S. (author), Nowak, M.P. (author), van Woerkom, D.J. (author), Quintero Pérez, M. (author), Cassidy, M.C. (author), Geresdi, A. (author), Koelling, S. (author), Car, D. (author), Plissard, S.R. (author), Bakkers, E.P.A.M. (author), Kouwenhoven, L.P. (author)
Topological superconductivity is a state of matter that can host Majorana modes, the building blocks of a topological quantum computer. Many experimental platforms predicted to show such a topological state rely on proximity-induced superconductivity. However, accessing the topological properties requires an induced hard superconducting gap,...
article 2017
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Further scaling and miniaturization of nanodevices (nanoelectronics, Quantum devices bio-nano devices for healthcare) brings major manufacturing, metrology and characterization challenges that cannot be met anymore by current techniques. The High Volume Manufacturing industry requires, more than ever, metrology methods that routinely measure...
conference paper 2017
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Verberk, R. (author), Koster, N.B. (author), te Sligte, E. (author), Staring, W.P.M. (author)
conference paper 2017
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Maas, D.J. (author), Muilwijk, P.M. (author), van Putten, M. (author), de Graaf, F. (author), Kievit, O. (author), Boerboom, P.B.T.H. (author), Koster, N.B. (author)
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass...
conference paper 2017
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Heo, J. (author), Xu, M. (author), Maas, D.J. (author)
public lecture 2017
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By end of 2017 there will be more than 8.4 billion connected devices (Gartner 2017). This means for the first time, Internet of Things (IoT) devices will outnumber the world’s population. In 2020, the number of connected devices will increase to more than 20 billion. This means nearly every devices we own or can imagine will be connected to the...
conference paper 2017
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Kruit, P. (author), de Kroon, M.G.M. (author), Maas, D.J. (author), Baumer, S.M.B. (author), Spruit, W.E.T. (author)
The field of 3D nano-structuring and metrology is advancing rapidly in the Netherlands and the rest of the world. In general, the quality of the involved investigators, knowledge institutes and companies in the Netherlands is world-class. Many Dutch academic groups / knowledge institutes / companies are world-leading in their own nano-arena. A...
report 2017
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Maas, D.J. (author)
The goal of the workshop is to provide a high level, invited only, international community that accelerates interactions between the main target groups: universities, institutes, entrepreneurs, intrapreneurs and investors in order to facilitate customer development, application discovery or funding start-ups & spin-offs to expand internationally...
conference paper 2017
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Zhang, H. (author), Gül, Ö. (author), Conesa-Boj, S. (author), Nowak, M.P. (author), Wimmer, M. (author), Zuo, K. (author), Mourik, V. (author), de Vries, F.K. (author), van Veen, J. (author), de Moor, M.W.A. (author), Bommer, J.D.S. (author), van Woerkom, D.J. (author), Car, D. (author), Plissard, S.R. (author), Bakkers, E.P.A.M. (author), Quintero Pérez, M. (author), Cassidy, M.C. (author), Koelling, S. (author), Goswami, S. (author), Watanabe, K. (author), Taniguchi, T. (author), Kouwenhoven, L.P. (author)
Semiconductor nanowires have opened new research avenues in quantum transport owing to their confined geometry and electrostatic tunability. They have offered an exceptional testbed for superconductivity, leading to the realization of hybrid systems combining the macroscopic quantum properties of superconductors with the possibility to control...
article 2017
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Maas, D.J. (author), Muilwijk, P.M. (author), van Putten, M. (author), de Graaf, F. (author), Kievit, O. (author), Boerboom, P.B.T.H. (author), Koster, N.B. (author)
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass...
other 2017
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van der Walle, P. (author), Kramer, E. (author), van der Donck, J.C.J. (author), Mulckhuyse, W.F.W. (author), Nijsten, L. (author), Bernal Arango, F.A. (author), de Jong, A. (author), van Zeijl, E. (author), Spruit, H.E.T. (author), van den Berg, J.H. (author), Nanda, G. (author), van Langen-Suurling, A.K. (author), Alkemade, P.F.A. (author), Pereira, S.F. (author), Maas, D.J. (author)
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification...
conference paper 2017
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Wetzels, F. (author), van den Berg, H. (author), Bosman, J. (author), van der Mei, R. (author)
Pre-congestion notification (PCN) protects inelastic traffic by using feedback on network link loads on and acting upon this accordingly. These actions comprise to admission control and termination of flows. Two PCN architectures have been defined by IETF: the centralized and decentralized PCN architecture. The decentralized PCN architecture has...
article 2017
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Naus, H.W.L. (author), Versluis, R. (author)
article 2017
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Versluis, R. (author), Poletto, S. (author), Khammassi, N. (author), Tarasinski, B. (author), Haider, N. (author), Michalak, D.J. (author), Bruno, A. (author), Bertels, K. (author), DiCarlo, L. (author)
We present a scalable scheme for executing the error-correction cycle of a monolithic surface-code fabric composed of fast-flux-tunable transmon qubits with nearest-neighbor coupling. An eight-qubit unit cell forms the basis for repeating both the quantum hardware and coherent control, enabling spatial multiplexing. This control uses three fixed...
article 2017
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Koster, N.B. (author), te Sligte, E. (author), Deutz, A.F. (author), Molkenboer, F.T. (author), Muilwijk, P.M. (author), van der Walle, P. (author), Mulckhuyse, W.F.W. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author)
Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under...
conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...
conference paper 2017
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te Sligte, E. (author), van Putten, M. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Koster, N.B. (author), Westerhout, J. (author), Kerkhof, P.J. (author), Oostdijck, B.W. (author), Mulckhuyse, W.F.W. (author), Deutz, A.F. (author)
TNO has built EBL2; a facility for EUV exposure testing and surface analysis. EBL2 is capable of testing EUV optics, EUV photomasks, pellicles, and other components under controlled conditions, relevant to EUV scanner and source operation at all foreseen source power nodes. The system consists of an EUV beam line coupled to an X-ray...
conference paper 2017
Searched for: subject%3A%22NI%255C%2B%255C-%255C%2BNano%255C%2BInstrumentation%22
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