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Tyack, P.L. (author), Benti, B. (author), Foskolos, I. (author), Bort, J. (author), Neves, M. (author), Biassoni, N. (author), Miller, P.J.O. (author)Auditory masking by anthropogenic noise may impact marine mammals relying on sound for important life functions, including echolocation. Animals have evolved antimasking strategies, but they may not be completely effective or cost-free. We formulated seven a priori hypotheses on how odontocete echolocation behavior could indicate masking. We...article 2022
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Kooi, F.L. (author), Toet, A. (author), Hoogervorst, M.A. (author), Bijl, P. (author)While AR has successfully been deployed in the military air domain for decades, its use in the ground domain poses serious challenges. Some of these challenges result from technological limitations. However, others are more difficult or even impossible to resolve since they reflect fundamental human characteristics. The toughest-to-solve...conference paper 2021
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Stortelder, J.K. (author), Ebeling, R.P. (author), Rijnsent, C.G.J. (author), van Putten, M. (author), Rooij-Lohmann, V.I.T.A. (author), Smit, M.E.M. (author), Storm, A.J. (author), Koster, N.B. (author), Lensen, H.A. (author), Philipsen, V. (author), Opsomer, K. (author), Thakare, D. (author), Feigl, T. (author), Naujok, P. (author)Novel reticle absorber materials are required for high-NA EUV lithography. TNO and ASML developed an assessment for the compatibility of novel high-NA reticle absorber materials with conditions that mimic the EUV scanner environment[1]. Four candidate reticle absorber materials were evaluated, TaCo, RuTa, PtMo and Pt2Mo alloys, in a joint...conference paper 2021
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Isojunno, S. (author), von Benda-Beckmann, A.M. (author), Wensveen, P.J. (author), Kvadsheim. P.H., (author), Frans-Peter A. Lam, (author), Gkikopoulou, K.C. (author), Pöyhönen, V. (author), Tyack, P.L. (author), Benti, B. (author), Foskolos, I. (author), Bort, J. (author), Miguel Neves, M. (author), Biassoni, N. (author), Miller, P.J.O. (author)Auditory masking by anthropogenic noise may impact marine mammals relying on sound for important life functions, including echolocation. Animals have evolved antimasking strategies, but they may not be completely effective or cost-free. We formulated seven a priori hypotheses on how odontocete echolocation behavior could indicate masking. We...article 2021
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Stortelder, J.K. (author), Storm, A.J. (author), de Rooij-Lohmann, V.I.T.A. (author), Wu, C.C. (author), van Schaik, W. (author)Novel absorber materials are being developed to improve EUV-reticle imaging performance for the next generations of EUV lithography tools. TNO, together with ASML, has developed a compatibility assessment for novel absorber materials, which addresses the risk that exposure of incompatible materials to EUV-radiation and EUV-plasma conditions...conference paper 2019
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Jin, J. (author), Segers, A.J. (author), Heemink, A. (author), Yoshida, M. (author), Han, W. (author), Lin, H.X. (author)Aerosol optical depths (AODs) from the new Himawari-8 satellite instrument have been assimilated in a dust simulation model over East Asia. This advanced geostationary instrument is capable of monitoring the East Asian dust storms which usually have great spatial and temporal variability. The quality of the data has been verified through a...article 2019
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Wu, C.C. (author), te Sligte, E. (author), Bekman, H. (author), Storm, A.J. (author), van Putten, M. (author), Limpens, M.P.M.A. (author), van Veldhoven, J. (author), Deutz, A.F. (author)EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and...conference paper 2018
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- Verberk, R. (author), Koster, N.B. (author), te Sligte, E. (author), Staring, W.P.M. (author) conference paper 2017
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Sadeghian Marnani, H. (author), Paul, P.C. (author), Herfst, R.W. (author), Dekker, A. (author), Winters, J. (author), Maturova, K. (author)Scanning Probe microscope (SPM) is an important nanoinstrument for several applications such as bioresearch, metrology, inspection and nanopatterning. Single SPM is associated with relatively slow rate of scanning and low throughput measurement, thus not being suitable for scanning large samples such as semiconductor wafers and photolithography...conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Deutz, A.F. (author), Molkenboer, F.T. (author), Muilwijk, P.M. (author), van der Walle, P. (author), Mulckhuyse, W.F.W. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author)Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under...conference paper 2017
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te Sligte, E. (author), van Putten, M. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Koster, N.B. (author), Westerhout, J. (author), Kerkhof, P.J. (author), Oostdijck, B.W. (author), Mulckhuyse, W.F.W. (author), Deutz, A.F. (author)TNO has built EBL2; a facility for EUV exposure testing and surface analysis. EBL2 is capable of testing EUV optics, EUV photomasks, pellicles, and other components under controlled conditions, relevant to EUV scanner and source operation at all foreseen source power nodes. The system consists of an EUV beam line coupled to an X-ray...conference paper 2017
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Hoogstrate, A.M. (author), Deutz, A.F. (author)TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis...conference paper 2016
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van Es, M.H. (author), Sadeghian Marnani, H. (author)Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1nm true 3D resolution over the entire surface. The limiting factor to do this is in the sensor itself:...conference paper 2016
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), Deutz, A.F. (author)TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components. EBL2 will consist of a Beam Line, an XPS system, and sample handling infrastructure. EBL2 will accept a wide range of sample sizes, including EUV masks with or without pellicles. All types of...conference paper 2016
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Wittekind, D. (author), Tougaard, J. (author), Stilz, P. (author), Dähne, M. (author), Clark, C.W. (author), Lucke, K. (author), von Benda-Beckmann, A.M. (author), Ainslie, M.A. (author), Siebert, U. (author)We estimated the long-range effects of air gun array noise on marine mammal communication ranges in the Southern Ocean. Air gun impulses are subject to significant distortion during propagation, potentially resulting in a quasi- continuous sound. Propagation modeling to estimate the received waveform was conducted. A leaky integrator was used as...bookPart 2016
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Bronkhorst, A.W. (author)How do we recognize what one person is saying when others are speaking at the same time? This review summarizes widespread research in psychoacoustics, auditory scene analysis, and attention, all dealing with early processing and selection of speech, which has been stimulated by this question. Important effects occurring at the peripheral and...article 2015
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Sadeghian Marnani, H. (author), Dekker, A. (author), Herfst, R.W. (author), Winters, J. (author), Eigenraam, A.B.C. (author), Rijnbeek, R.A. (author), Nulkes, N. (author)With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D and the throughput. Due to the advantages of sub-nanometer resolution and the ability of true 3D...conference paper 2015
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Ettwig, J.F. (author), Bronkhorst, A.W. (author)In four experiments, we studied the time course of interference between detection of an oddball orientation target (OT) in an 8-item circular search display, and identification of a letter target (LT) in a central stream of distractor letters. Dual-task performance for different temporal lags between targets was compared to single-task...article 2015
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te Sligte, E. (author), Koster, N.B. (author), Deutz, A.F. (author), Staring, W.P.M. (author)The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable...conference paper 2014