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Lama, S. (author), Houweling, S. (author), Boersma, K.F. (author), Aben, I. (author), Denier van der Gon, H.A.C. (author), Krol, M.C. (author)Movement restrictions were imposed in 2020 to mitigate the spread of Covid-19. These lock-down episodes provide a unique opportunity to study the sensitivity of urban photochemistry to temporary emission reductions and test air quality models. This study uses Tropospheric Monitoring Instrument (TROPOMI) nitrogen dioxide/carbon monoxide (NO2/CO)...article 2023
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Deumel, S. (author), van Breemen, A.J.J.M. (author), Peeters, B. (author), Maas, J. (author), Akkerman, H.B. (author), Meulenkamp, E.A. (author), Gelinck, G.H. (author), Huerdler, J.E. (author), Schmidt, O. (author), Heiss, W. (author), Tedde, S.F. (author)Future medical X-ray imaging will benefit from advances in computing power and artificial intelligence as well as improvements in the X-ray detector performance itself. Hybrid inorganic-organic perovskite materials promise direct conversion detectors with higher image quality, owing to their strong X-ray absorption, high electron and hole...conference paper 2022
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Stortelder, J.K. (author), Ebeling, R.P. (author), Rijnsent, C.G.J. (author), van Putten, M. (author), Rooij-Lohmann, V.I.T.A. (author), Smit, M.E.M. (author), Storm, A.J. (author), Koster, N.B. (author), Lensen, H.A. (author), Philipsen, V. (author), Opsomer, K. (author), Thakare, D. (author), Feigl, T. (author), Naujok, P. (author)Novel reticle absorber materials are required for high-NA EUV lithography. TNO and ASML developed an assessment for the compatibility of novel high-NA reticle absorber materials with conditions that mimic the EUV scanner environment[1]. Four candidate reticle absorber materials were evaluated, TaCo, RuTa, PtMo and Pt2Mo alloys, in a joint...conference paper 2021
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Mahon, N.S. (author), Korolik, O.V. (author), Khenkin, M.V. (author), Arnaoutakis, G.E. (author), Galagan, Y. (author), Soriūtė, V. (author), Litvinas, D. (author), Scajev, P. (author), Katz, E.A. (author), Mazanik, A.V. (author)The research on halide perovskites is in its peak activity at the moment due to the material's potential application in photovoltaics. It is well known that slow processes, from seconds to minutes, are very significant in perovskite films and devices as compared to conventional photovoltaic materials. The kinetics of photoluminescence (PL) is...article 2020
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- Dong, D. (author), Espinoza, L.A.T. (author), Loibl, A. (author), Pfaff, M. (author), Tukker, A. (author), van der Voet, E. (author) article 2020
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Zhu, Y. (author), Rougieux, F. (author), Grant, N.E. (author), Du Guzman, J.A.T. (author), Murphy, J.D. (author), Markevich, V.P. (author), Coletti, G. (author), Peaker, A.R. (author), Hameiri, Z. (author)—Float-zone (FZ) silicon is usually assumed to be bulk defect-lean and stable. However, recent studies have revealed that detrimental defects can be thermally activated in FZ silicon wafers and lead to a reduction of carrier lifetime by up to two orders of magnitude. A robust methodology which combines different characterization techniques and...article 2020
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van der Walle, P. (author), Stortelder, J.K. (author), Wu, C.C. (author), Lensen, H.A. (author), Koster, N.B. (author)The EUV BeamLine 2 (EBL2) is being used to expose samples to EUV radiation for optics and mask lifetime testing. Before and after exposure the samples can be analyzed in-situ by X-ray photoelectron spectroscopy (XPS). During exposure the samples can be monitored in real-time by an imaging ellipsometer. We report on the development of two...conference paper 2020
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Zhu, Y. (author), Juhl, M.K. (author), Coletti, G. (author), Hameiri, Z. (author)In photoconductance (PC) based carrier lifetime measurement, artificially high values at low-to-medium injection levels are often observed because of the presence of minority carrier traps in the sample. In this paper, we demonstrate that the traps in n-type Czochralski silicon are in a transient regime under the typical quasi-steady-state...article 2019
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Stortelder, J.K. (author), Storm, A.J. (author), de Rooij-Lohmann, V.I.T.A. (author), Wu, C.C. (author), van Schaik, W. (author)Novel absorber materials are being developed to improve EUV-reticle imaging performance for the next generations of EUV lithography tools. TNO, together with ASML, has developed a compatibility assessment for novel absorber materials, which addresses the risk that exposure of incompatible materials to EUV-radiation and EUV-plasma conditions...conference paper 2019
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Bekman, H.H.P.T. (author), Dekker, M.F. (author), Ebeling, R.P. (author), Janssen, J.P.B. (author), Koster, N.B. (author), Meijlink, J.R. (author), Molkenboer, F.T. (author), Nicolai, K. (author), van Putten, M. (author), Rijnsent, C.G.J. (author), Storm, A.J. (author), Stortelder, J.K. (author), Wu, C.C. (author), de Zanger, R.M.S. (author)Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and installed at TNO, in close cooperation with Carl Zeiss. There was a desire to improve on the performance...conference paper 2019
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Tool, C.J.J. (author), Stodolny, M.K. (author), Anker, J. (author), Janssen, G.J.M. (author), Lenes, M. (author), Romijn, I. (author)A record low surface recombination current for boron doped p+poly-Si passivation on random pyramid textured Cz wafers(Jo,s of 10 fA/cm2) has been achieved, with an outlook to even lower Jo,s values. Solar cells have been completed using a lowcost process flow based on screen-printed and firing-through metallization and with a process flow that...conference paper 2018
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van de Weijer, P. (author), Akkerman, H.B. (author), Bouten, P.C.P. (author), Panditha, P. (author), Klaassen, P.J.M. (author), Salem, A. (author)Side leakage experiments have been performed on the organic interlayer, so-called organic coating for planarization (OCP), in a hybrid thin-film encapsulation (TFE) stack based on two silicon nitride (SiN) barrier layers that was developed for organic light-emitting diodes (OLED). To measure the side leakage into OCP, a metallic Ca thin-film...article 2018
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Wu, C.C. (author), te Sligte, E. (author), Bekman, H. (author), Storm, A.J. (author), van Putten, M. (author), Limpens, M.P.M.A. (author), van Veldhoven, J. (author), Deutz, A.F. (author)EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and...conference paper 2018
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- Verberk, R. (author), Koster, N.B. (author), te Sligte, E. (author), Staring, W.P.M. (author) conference paper 2017
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Hoogstrate, A.M. (author), Deutz, A.F. (author)TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis...conference paper 2016
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Dragt, R.C. (author), Maljaars, J. (author), Tuitman, J.T. (author), Salman, Y. (author), Otheguy, M.E. (author)Retardation is a load sequence effect, which causes a reduced fatigue crack growth rate after an overload is encountered. Retardation can be cancelled when the overload is followed by an underload. The net effect is beneficial to the fatigue lifetime of Offshore Wind Turbines (OWTs). To be able to take this into account, computationally...conference paper 2016
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van de Weijer, P. (author), Lu, K. (author), Janssen, R.R. (author), de Winter, S.H.P.M. (author), Akkerman, H.B. (author)When organic light-emitting diodes (OLEDs) are exposed to the ambient atmosphere, water penetration through pinholes in the cathode results in the formation of non-emissive areas (black spots) due to local oxidation of the cathode around the pinhole. This degradation effect severely limits the lifetime of OLED devices and requires high...article 2016
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Theelen, M. (author), Foster, C. (author), Steijvers, H. (author), Barreau, N. (author), Frijters, C. (author), Vroon, Z. (author), Zeman, M. (author)CIGS solar cells and non-covered molybdenum areas and scribes were exposed to liquid water purged with the atmospheric gases carbon dioxide (CO2), oxygen (O2), nitrogen (N2) and air in order to investigate their degradation behavior. The samples were analyzed by electrical, compositional and optical measurements before, during and after exposure...conference paper 2015
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de Klerk, W.P.C. (author)The surveillance of gun propellants is basically performed either by an investigation into the thermal behavior of the propellant or by the determination of its remaining effective stabilizer content. Over the years it is shown that the surveillance of NC based gun propellants is necessary. NC based materials are intrinsically unstable, and can...article 2015
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Jolt Oostra, A. (author), Blom, P.W.M. (author), Michels, J.J. (author)Pinholes in the emitting layer of an organic light emitting diode (OLED), e.g. induced by particle contamination or processing flaws, lead to direct contact between the hole-injection layer (HIL) and the cathode. The resulting short circuits give rise to catastrophic device failure. We demonstrate that these short circuits can be effectively...article 2014