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- Mameli, A. (author), Roozeboom, F. (author) public lecture 2021
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Roozeboom, F. (author)The IRDS 2017 Roadmap catches the scaling challenges faced by the semiconductor industry in the upcoming decades by the overall term "3D Power Scaling". In the past scaling era superior material properties and critical dimensions nearing single-digit nanometer values could still be realized by cost-effective technology solutions. As we approach...public lecture 2021
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Mione, M.A. (author), Vandalon, V. (author), Mameli, A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2 plasma is reported along with an investigation of its underlying growth mechanism. Within the temperature range of 100−250 °C, the process demonstrates self-limiting growth with a growth per...article 2021
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Roozeboom, F. (author), Ehm, D.H. (author), Illiberi, A. (author), Becker, M. (author), te Sligte, E. (author), Creijghton, Y.L.M. (author)A method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation includes: performing an atomic layer etching process for at least partially removing the contamination layer (24) from the optical surface (14a), which, in tum, includes: exposing the...patent 2021
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- Mameli, A. (author), Brüner, P. (author), Roozeboom, F. (author), Grehl, T. (author), Poodt, P. (author) public lecture 2020
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Ushakov, A. (author), Stephan, U. (author), Steinke, O. (author), Verlaan, A.L. (author), de Bock, M. (author), Maniscalco, M.P. (author), Verhoeff, P. (author)The Visible Spectroscopy Reference System (VSRS.55.E6) is going to be one of the first optical diagnostics in the ITER tokamak. The VSRS front-end part shall contains the 100 mm diameter first mirror (FM). The FM is expected to experience contamination with beryllium and tungsten. Levels of contamination on the order of 10 nm degrade the FM...conference paper 2020
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- Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2019
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author)Area-selective atomic layer deposition (AS-ALD) has the potential for pushing device manufacturing towards new frontiers. However, the selectivity that can be obtained is often very limited and the throughput of most AS-ALD methods is low, which hampers its industrial acceptance.[1,2] In this work, we present a process for AS-ALD of SiO2 using...public lecture 2019
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- Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2019
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- Roozeboom, F. (author) public lecture 2019
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- Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2019
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- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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Guo, Y. (author), van Ravensteijn, B.G.P. (author), Kegel, W.K. (author)Dimple colloids with well-defined cavities were synthesized by a modified dispersion polymerization. The key step in the procedure is the delayed addition of crosslinkers into the reaction mixture. By systematically studying the effect of the delayed addition time and the concentration of the cross-linker on the resulting particle morphology, we...article 2019
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- Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures for large area applications. The spatial separation of the ALD half-reactions and the use of an atmospheric pressure plasma as the reactant give rise to complex surface chemistry which is...article 2019
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...article 2018
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...article 2018
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- conference paper 2017
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