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Wu, Y. (author), Macco, B. (author), Vanhemel, D. (author), Koelling, S. (author), Verheijen, M.A. (author), Koenraad, P.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...
article 2016
document
Creyghton, Y. (author), Illiberi, A. (author), Mione, M. (author), van Boekel, W. (author), Debernardi, N. (author), Seitz, M. (author), van den Bruele, F. (author), Poodt, P. (author), Roozeboom, F. (author)
Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with...
conference paper 2016
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Roozeboom, F. (author)
public lecture 2016
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French, P. (author), Krijnen, G. (author), Roozeboom, F. (author)
Microsystems are increasingly being applied in harsh and/or inaccessible environments, but many markets expect the same level of functionality for long periods of time. Harsh environments cover areas that can be subjected to high temperature, (bio)-chemical and mechanical disturbances, electromagnetic noise, radiation, or high vacuum. In the...
article 2016
document
Fleck, K. (author), Aslam, N. (author), Hoffmann-Eifert, S. (author), Longo, V. (author), Roozeboom, F. (author), Kessels, W.M.M. (author), Böttger, U. (author), Waser, R. (author), Menzel, S. (author)
Compared to conventional NAND flash resistive switching metal-oxide cells show a number of advantages, like an increased endurance, lower energy consumption, and superior switching speed. Understanding the role of defects for the resistive switching phenomenon in metal oxides is crucial for their improvement and thereby also for their acceptance...
article 2016
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Nanda, G. (author), van Veldhoven, E. (author), Maas, D.J. (author), Sadeghian Marnani, H. (author), Alkemade, P.F.A. (author)
The authors report the direct-write growth of hammerhead atomic force microscope (AFM) probes by He+ beam induced deposition of platinum-carbon. In order to grow a thin nanoneedle on top of a conventional AFM probe, the authors move a focused He+ beam during exposure to a PtC precursor gas. In the final growth stage, a perpendicular movement of...
article 2015
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Ben Messaoud, K. (author), Buffière, M. (author), Brammertz, G. (author), ElAnzeery, H. (author), Oueslati, S. (author), Hamon, J. (author), Kniknie, B.J. (author), Meuris, M. (author), Amlouk, M. (author), Poortmans, J. (author)
Modification of the absorber surface properties by Cd2+ treatment (Cd2+ partial electrolyte) results in the following: formation of Cd(OH)2 on the absorber surface, deposition of thinner chemical bath-deposited CdS buffer layer, and a smaller space charge region. The impact on electrical performances is as follows: decrease of the series...
article 2015
document
van der Linden, R.J.P. (author), Marck, J.W. (author), de Boer, J.P. (author)
Operating maturing assets poses increasingly complex challenges to operators. Meeting hourly or daily production targets becomes more difficult when wells are more often shut in for e.g. water washes (against salt deposition) or solvent jobs (at asphaltenes deposition). Declining reservoir pressure in turn results in less margin to compensate...
conference paper 2015
document
Roozeboom, F. (author), van den Bruele, F. (author), Creyghton, Y. (author), Poodst, P. (author), Kessels, W.M.M. (author)
Conventional (3D) etching in silicon is often based on the ‘Bosch’ plasma etch with alternating half-cycles of a directional Sietch and a fluorocarbon polymer passivation. Also shallow feature etching is often based on cycled processing. Likewise, ALD is time-multiplexed, with the extra benefit of half-reactions being self-limiting, thus...
article 2015
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Illiberi, A. (author), Cobb, B. (author), Sharma, A. (author), Grehl, T. (author), Brongersma, H. (author), Roozeboom, F. (author), Gelinck, G. (author), Poodt, P. (author)
We have investigated the nucleation and growth of InGaZnO thin films by spatial atmospheric atomic layer deposition. Diethyl zinc (DEZ), trimethyl indium (TMIn), triethyl gallium (TEGa), and water were used as Zn, In, Ga and oxygen precursors, respectively. The vaporized metal precursors have been coinjected in the reactor. The metal composition...
article 2015
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Illiberi, A. (author), Frijters, C. (author), Balder, J.E. (author), Poodt, P.W.G. (author), Roozeboom, F. (author)
Spatial Atmosperic Atomic Layer Depositon combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rages (up tot nm/s). In this paper we present a short overview of our research acctivity carried out on S-ALD of functional thin filsm for the front window of...
article 2015
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Faraz, T. (author), Roozeboom, F. (author), Knoops, H.C.M. (author), Kessels, W.M.M. (author)
Current trends in semiconductor device manufacturing impose extremely stringent requirements on nanoscale processing techniques, both in terms of accurately controlling material properties and in terms of precisely controlling nanometer dimensions. To take nanostructuring by dry etching to the next level, there is a fast growing interest in so...
article 2015
document
Roozeboom, F. (author), van den Bruele, F. (author), Creyghton, Y.L.M. (author), Poodt, P.W.G. (author), Kessels, W.M.M. (author)
article 2015
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Schutte, K.C.J. (author), Portela, L.M. (author), Twerda, A. (author), Henkes, R.A.W.M. (author)
In this work, we propose a detailed numerical model for asphaltene agglomeration and deposition, as induced by a resolved turbulent liquid carrier phase flow, in which transport, breakup, and re-entrainment are also taken into account. Asphaltene phase separation is represented by the appearance of adhesive primary particles, which bond upon...
article 2015
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Walser, T. (author), Meyer, D. (author), Fransman, W. (author), Buist, H. (author), Kuijpers, E. (author), Brouwer, D. (author)
Life-Cycle Assessment (LCA) is a well-established method to evaluate impacts of chemicals on the environment and human health along the lifespan of products. However, the increasingly produced and applied nanomaterials (defined as one dimension
article 2015
document
Fokker, P.A. (author), Visser, J. (author)
We report a field study on solution mining of magnesium chloride from bischofite layers in the Netherlands at depths between 1500 and 1850 m. Subsidence that was observed in the area is due to part of the brine production being realized by cavern squeeze; some of which were connccted. Wc used an earlier developed inversion scheme to quantify the...
conference paper 2014
document
Ocola, L.E. (author), Rue, C. (author), Maas, D.J. (author)
Over the last few years, significant improvements in sources, columns, detectors, control software, and accessories have enabled a wealth of new focused ion beam applications. In addition, modeling has provided many insights into ion-sample interactions and the resultant effects on the sample. With the knowledge gained, the community has found...
article 2014
document
van de Burgt, Y. (author), van Loon, W. (author), Mandamparambil, R. (author), Bellouard, Y. (author)
The localized growth of carbon nanotube structures has potential in many applications such as interconnects, field emitters and sensors. Using a laser to locally heat the substrate offers a highly versatile process compatible with a broad range of substrates and devices. However, for laser-assisted CNT growth, detailed process information, such...
article 2014
document
Van Assche, F.J.H. (author), Unnikrishnan, S. (author), Michels, J.J. (author), van Mol, A.M.B. (author), van de Weijer, P. (author), van de Sanden, M.C.M. (author), Creatore, M. (author)
We report on a low substrate temperature (110°C) remote microwave plasma-enhanced chemical vapor deposition (PECVD) process of silicon nitride barrier layers against moisture permeation for organic light emitting diodes (OLEDs) and other moisture sensitive devices such as organic photovoltaic cells (OPVs). Specifically, the influence of the SiH4...
article 2014
document
Eggenhuisen, T.M. (author), Coenen, M.J.J. (author), Slaats, M.W.L. (author), Groen, W.A. (author)
The transfer of laboratory scale solution processing of organic electronics to large area roll-to-roll production requires the use of up-scalable deposition techniques. Furthermore, industrial production demands the omission of halogenated and other harmful solvents. Here, the authors discuss large area inkjet printing using industrial...
article 2014
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