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Vivanco, M.G. (author), Bessagnet, B. (author), Cuvelier, C. (author), Theobald, M.R. (author), Tsyro, S. (author), Pirovano, G. (author), Aulinger, A. (author), Bieser, J. (author), Calori, G. (author), Ciarelli, G. (author), Manders, A. (author), Mircea, M. (author), Aksoyoglu, S. (author), Briganti, G. (author), Cappelletti, A. (author), Colette, A. (author), Couvidat, F. (author), D'Isidoro, M. (author), Kranenburg, R. (author), Meleux, F. (author), Menut, L. (author), Pay, M.T. (author), Rouïl, L. (author), Silibello, C. (author), Thunis, P. (author), Ung, A. (author)
In the framework of the UNECE Task Force on Measurement and Modelling (TFMM) under the Convention on Long-range Transboundary Air Pollution (LRTAP), the EURODELTAIII project is evaluating how well air quality models are able to reproduce observed pollutant air concentrations and deposition fluxes in Europe. In this paper the sulphur and nitrogen...
article 2017
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Roozeboom, F. (author)
public lecture 2017
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Nickel, S. (author), Schröder, W. (author), Wosniok, W. (author), Harmens, H. (author), Frontasyeva, M.V. (author), Alber, R. (author), Aleksiayenak, J. (author), Barandovski, L. (author), Blum, O. (author), Danielsson, H. (author), de Temmermann, L. (author), Dunaev, A.M. (author), Fagerli, H. (author), Godzik, B. (author), Ilyin, I. (author), Jonkers, S. (author), Jeran, Z. (author), Pihl Karlsson, G. (author), Lazo, P. (author), Leblond, S. (author), Liiv, S. (author), Magnússon, S.H. (author), Mankovska, B. (author), Martínez-Abaigar, J. (author), Piispanen, J. (author), Poikolainen, J. (author), Popescu, I.V. (author), Qarri, F. (author), Radnovic, D. (author), Santamaria, J.M. (author), Schaap, M. (author), Skudnik, M. (author), Špirić, Z. (author), Stafilov, T. (author), Steinnes, E. (author), Stihi, C. (author), Suchara, I. (author), Thöni, L. (author), Uggerud, H.T. (author), Zechmeister, H.G. (author)
Objective This study explores the statistical relations between the concentration of nine heavy metals (HM) (arsenic (As), cadmium (Cd), chromium (Cr), copper (Cu), mercury (Hg), nickel (Ni), lead (Pb), vanadium (V), zinc (Zn)), and nitrogen (N) in moss and potential explanatory variables (predictors) which were then used for mapping spatial...
article 2017
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Mione, M.A. (author), Katsouras, I. (author), Creyghton, Y. (author), van Boekel, W. (author), Maas, J. (author), Gelinck, G. (author), Roozeboom, F. (author), Illiberi, A. (author)
High permittivity (high-k) materials have received considerable attention as alternatives to SiO2 for CMOS and low-power flexible electronics applications. In this study, we have grown high-quality ZrO2 by using atmospheric-pressure plasma-enhanced spatial ALD (PE-sALD), which, compared to temporal ALD, offers higher effective deposition rates...
article 2017
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Roozeboom, F. (author)
public lecture 2017
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Frijters, C.H. (author), Bolt, P.J. (author), Poodt, P. (author), Knaapen, R. (author), van den Brink, J. (author), Ruth, M. (author), Bremaud, D. (author), Illiberi, A. (author)
In this manuscript we present the first successful application of a spatial atomic-layer-deposition process to thin film solar cells. Zn(O,S) has been grown by spatial atomic layer deposition (S-ALD) at atmospheric pressure and applied as buffer layer in rigid and flexible CIGS cells by a lab-scale (15×15 cm2) S-ALD set-up. We achieved values of...
conference paper 2017
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Creyghton, Y. (author), Illiberi, A. (author), Roozeboom, F. (author)
public lecture 2017
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Mameli, A. (author), Kuang, Y. (author), Aghaee, M. (author), Ande, C.K. (author), Karasulu, B. (author), Creatore, M. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
article 2017
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Mircea, M. (author), Bessagnet, B. (author), Vivanco, M.G. (author), Cuvelier, C. (author), Pirovano, G. (author), Tsyro, S. (author), Aksoyoglu, S. (author), Manders, A. (author), Pay, M.T. (author), Stern, R. (author), Aas, W. (author), Prévôt, A.S.H. (author), Aulinger, A. (author), Baldasano, J.M. (author), Bieser, J. (author), Briganti, G. (author), Calori, G. (author), Cappelletti, A. (author), Carnevale, C. (author), Ciarelli, G. (author), Colette, A. (author), Couvidat, F. (author), D’Isidoro, M. (author), Dupont, J.C. (author), Fagerli, H. (author), Finardi, S. (author), Gonzalez, L. (author), Kranenburg, R. (author), Meleux, F. (author), Menut, L. (author), Roberts, P. (author), Rouïl, L. (author), Silibello, C. (author), Theobald, M.R. (author), Thunis, P. (author), Ung, A. (author), White, L. (author)
The EURODELTA III (ED-III) exercise aimed to perform a comprehensive chemistry transport model inter-comparison study exploiting the data from four intensive measurement campaigns carried out by EMEP. The campaigns were held in different seasons (1–30 June 2006; 8 January–4 February 2007; 17 September–15 October 2008; 25 February–26 March 2009)...
conference paper 2017
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Erkens, I.J.M. (author), Verheijen, M.A. (author), Knoops, H.C.M. (author), Keuning, W. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)
To date, conventional thermal atomic layer deposition (ALD) has been the method of choice to deposit high-quality Pt thin films grown typically from (MeCp)PtMe3 vapor and O2 gas at 300 °C. Plasma-assisted ALD of Pt using O2 plasma can offer several advantages over thermal ALD, such as faster nucleation and deposition at lower temperatures. In...
article 2017
document
Mione, M.A. (author), Katsouras, I. (author), Creyghton, Y. (author), van Boekel, W. (author), Maas, J. (author), Gelinck, G. (author), Roozeboom, F. (author), Illiberi, A. (author)
High permittivity (high-k) materials have received considerable attention as alternatives to SiO2 for CMOS and low-power flexible electronics applications. In this study, we have grown high-quality ZrO2 by using atmospheric-pressure plasma-enhanced spatial ALD (PE-sALD), which, compared to temporal ALD, offers higher effective deposition rates...
article 2017
document
Mameli, A. (author), Merkx, M.J.M. (author), Karasulu, B. (author), Roozeboom, F. (author), Kessels, W.E.M.M. (author), MacKus, A.J.M. (author)
Area-selective atomic layer deposition (ALD) is rapidly gaining interest because of its potential application in self-aligned fabrication schemes for next-generation nanoelectronics. Here, we introduce an approach for area-selective ALD that relies on the use of chemoselective inhibitor molecules in a three-step (ABC-type) ALD cycle. A process...
article 2017
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Abbel, R. (author), de Vries, I. (author), Langen, A. (author), Kirchner, G. (author), T’Mannetje, H. (author), Gorter, H. (author), Wilson, J. (author), Groen, P. (author)
The large volume production of flexible electronics by solution based roll-to-roll (R2R) manufacturing technologies is a promising upscaling strategy for the organic electronics industry. Typical optoelectronic devices like organic light emitting diodes (OLEDs) consist of a complex stack of functional layers. Solution deposition of these...
article 2017
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Frijters, C.H. (author), Bolt, P.J. (author), Poodt, P.W.G. (author), Knaapen, R. (author), van den Brink, J. (author), Ruth, M. (author), Bremaud, D. (author), Illiberi, A. (author)
In this manuscript we present the first successful application of a spatial atomic-layer-deposition process to thin film solar cells. Zn(O,S) has been grown by spatial atomic layer deposition (S-ALD) at atmospheric pressure and applied as buffer layer in rigid and flexible CIGS cells by a lab-scale (15x15 cm2) S-ALD set-up. We achieved values of...
conference paper 2016
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Blanker, J. (author), Vroon, Z. (author), Zeman, M. (author), Smets, A. (author)
Copper-indium-gallium-di-selenide (CIGS) is the present record holder in lab-scale thin-film photovoltaics (TFPV). One of the problems of this PV technology is the scarcity of indium. Multi-junction solar cells allow better spectral utilization of the light spectrum, while the required current generation per layer is much lower, allowing much...
conference paper 2016
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Mameli, A. (author), van den Bruele, F. (author), Ande, C.K. (author), Verheijen, M.A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
In this work we studied the deposition of silver (Ag) by spatial-ALD on molybdenum layers serving as a growth model substrate. Mo-layers were selected for testing the suitability of spatial-ALD in fabricating MoO3/Ag/MoO3 tri-layer transparent conductor (TC) stacks used for light-management optimization in organic-based and perovskites solar...
conference paper 2016
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Mameli, A. (author), Aghaee, M. (author), Kuang, Y. (author), Creatore, M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
We demonstrate direct-write[1]ALD of In2O3:H patterns with good selectivity on large area substrates. The nucleation delay on H-terminated surfaces is exploited to achieve area selective deposition w/o any subtractive step (e.g. etching, SAMs, litho, lift-off). Selectivity is achieved by tailoring the surface groups using a μ-plasma printer with...
public lecture 2016
document
conference paper 2016
document
Frijters, C. (author), Bolt, P.J. (author), Poodt, P. (author), Roozeboom, F. (author), Illiberi, A. (author)
public lecture 2016
document
Creyghton, Y. (author), Illiberi, A. (author), Mione, M. (author), van Boekel, W. (author), Debernardi, N. (author), Seitz, M. (author), van den Bruele, F. (author), Poodt, P. (author), Roozeboom, F. (author)
Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH,...
conference paper 2016
Searched for: subject%3A%22Deposits%22
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