Searched for: subject%3A%22Deposits%22
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Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author)
public lecture 2019
document
Katsouras, I. (author), Frijters, C. (author), Poodt, P. (author), Gelinck, G. (author), Kronemeijer, A.J. (author)
Indium gallium zinc oxide (IGZO) is deposited using plasma‐enhanced spatial atomic layer deposition (sALD) on substrates as large as 32 × 35 cm2. Excellent uniformity and thickness control leads to high‐performing and stable coplanar top‐gate self‐aligned (SA) thin‐film transistors (TFTs). The integration of a sALD‐deposited aluminum oxide...
article 2019
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Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2019
document
Katsouras, I. (author), Frijters, C. (author), Poodt, P. (author), Gelinck, G. (author), Kronemeijer, A.J. (author)
Indium gallium zinc oxide (IGZO) is deposited using plasma-enhanced spatial atomic layer deposition (sALD) on substrates as large as 32 × 35 cm 2 . Excellent uniformity and thickness control leads to high-performing and stable coplanar top-gate self-aligned (SA) thin-film transistors (TFTs). The integration of a sALD-deposited aluminum oxide...
article 2019
document
Faraz, T. (author), Arts, K. (author), Karwal, S. (author), Knoops, H.C.M. (author), Kessels, W.M.M. (author)
Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in the synthesis of nanoscale films with precise growth control. Apart from the well-established contribution of highly reactive neutral radicals towards film growth in PEALD, the ions generated by the plasma can also play a significant role. In this work, we...
article 2019
document
Zardetto, V. (author), Galagan, Y. (author), Creatore, M. (author), Coletti, G. (author), Poodt, P. (author), Veenstra, S. (author), Andriessen, R. (author), di Giacomo, F. (author), Zhang, D. (author), Burgess, C. (author), Verhees, W. (author), Fledderus, H. (author), Dogan, I. (author), Najafi, M. (author), Lifka, H. (author)
In order to commercialize the perovskite solar cells (PSC) technology, efficient and industrial deposition methods over large areas have to be adopted, and the device architectures have to provide long term stability. In this work we combine several upscalable deposition methods to develop a stable semitransparent PSC. The control of the...
conference paper 2019
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Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2019
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Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures for large area applications. The spatial separation of the ALD half-reactions and the use of an atmospheric pressure plasma as the reactant give rise to complex surface chemistry which is...
article 2019
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Eggenkamp, H.G.M. (author), Louvat, P. (author), Griffioen, J. (author), Agrinier, P. (author)
article 2019
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Miksys, J. (author), Arutinov, G. (author), Römer, G.R.B.E. (author)
Silver nanoparticle inks are among the key functional materials used in printed electronics. Depositing it by laser-induced forward transfer remains a challenging task because the non-linear rheological nature of these inks narrows the range of the laser processing parameters. Understanding, therefore, the influence of the laser parameters on...
article 2019
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Mameli, A. (author), Karsulu, B. (author), Verheijen, M.A. (author), Barcones, B. (author), Macco, B. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant. The selectivity of the ALD process was studied using in situ spectroscopic ellipsometry and scanning electron microscopy, revealing improved...
article 2019
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Illiberi, A. (author), Frijters, C. (author), Ruth, M. (author), Bermaud, D. (author), Poodt, P. (author), Roozeboom, F. (author), Bolt, J.P. (author)
Zinc oxysulfide (ZnOS) is synthesized at atmospheric pressure in a laboratory-scale spatial atomic layer deposition setup by sequentially exposing the substrate to diethyl zinc and an H2O/H2S mixture, separated by a nitrogen gas curtain. The co-injection of H2O and H2S vapors in the same deposition zone enables an accurate control of the S/(O +...
article 2018
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...
article 2018
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Galagan, Y. (author)
Research progress in hybrid perovskite solar cells has increased enormously over the last years, making perovskites very promising candidates for future PV technologies. Perovskite solar cells use abundant and low-cost starting materials, providing economic advantages for large-scale implementation. A transition from laboratory-scale fabrication...
article 2018
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Paap, B. (author), Kraaijpoel, D. (author), Bakker, M. (author), Gharti, H.N. (author)
Gas extraction from the Groningen natural gas field, situated in the Netherlands, frequently induces earthquakes in the reservoir that cause damage to buildings, and pose a safety hazard and a nuisance to the local population. Due to the dependence of the national heating infrastructure on Groningen gas, the short-term mitigation measures are...
article 2018
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Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
conference paper 2018
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di Giacomo, F.D. (author), Fledderus, H. (author), Gorter, H. (author), Kirchner, G. (author), Vries, I.D. (author), Dogan, I. (author), Verhees, W. (author), Zardetto, V. (author), Najafi, M. (author), Zhang, D. (author), Lifka, H. (author), Galagan, Y. (author), Aernouts, T. (author), Veenstra, S. (author), Groen, P. (author), Andriesse, R. (author)
The industrialization of perovskite solar cells (PSC) require processes to efficiently deposit the constituent layers over large areas. In this work we optimized the use of slot die coating process for both sheet-to-sheet (S2S) and roll-to-roll (R2R) manufacturing. Particular focus have been put on the control of the uniformity of perovskite...
conference paper 2018
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Zardetto, V. (author), Senes, A. (author), Najafi, M. (author), Zhang, D. (author), Joly, R. (author), Chippari, M. (author), Arneouts, T. (author), Poodt, P. (author), Veenstra, S. (author), Andriessen, R. (author)
In order to bring the organo-lead halide perovskite solar cells (PSC) towards the commercialization, the device stability needs to be drastically improved. Our approach relies on the introduction of a compact metal oxide (MeO) layer in a p-i-n planar architecture by means of atmospheric pressure spatial atomic layer deposition (s-ALD) technique....
conference paper 2018
document
Szinyei, D. (author), Gelybó, G. (author), Guenther, A.B. (author), Turnipseed, A.A. (author), Tóth, E. (author), Builtjes, P.J.H. (author)
In this study, we evaluated three conceptually similar ozone gas deposition models. These dry deposition models are frequently used with chemical transport models for calculations over large spatial domains. However, large scale applications of surface-atmosphere exchange of reactive gases require modeling results as accurate as possible to...
article 2018
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Illiberi, A. (author), Katsouras, I. (author), Gazibegovic, S. (author), Cobb, B. (author), Nekovic, E. (author), van Boekel, W. (author), Frijters, C. (author), Maas, J. (author), Roozeboom, F. (author), Creyghton, Y. (author), Gelinck, G. (author)
In this manuscript, the authors investigate the growth of indium zinc oxide, indium zinc oxide (InZnO, IZO) as a channel material for thin-film transistors. IZO is grown at atmospheric pressure and a high deposition rate using spatial atomic layer deposition (S-ALD). By varying the ratio of diethylzinc and trimethylindium vapor, the In/(In þ Zn)...
article 2018
Searched for: subject%3A%22Deposits%22
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