Searched for: subject%3A%22Chemical%255C%2Bvapor%255C%2Bdeposition%22
(1 - 20 of 23)

Pages

List view
Grid view
document
Melskens, J. (author), Theeuwes, R.J. (author), Black, L.E. (author), Berghuis, W.J.H. (author), Macco, B. (author), Bronsveld, P.C.P. (author), Kessels, W.M.M. (author)
article 2021
document
Blanker, J. (author), Vroon, Z.A.E.P. (author), Zeman, M. (author), Smets, A. (author)
Copper-indium-gallium-di-selenide (CIGS) is the present record holder in lab-scale thin-film photovoltaics (TF-PV). One of the problems of this PV technology is the scarcity of indium. Multi-junction solar cells allow better spectral utilization of the light spectrum, while the required current generation per layer is much lower, allowing much...
conference paper 2018
document
Blanker, J. (author), Vroon, Z. (author), Zeman, M. (author), Smets, A. (author)
Copper-indium-gallium-di-selenide (CIGS) is the present record holder in lab-scale thin-film photovoltaics (TFPV). One of the problems of this PV technology is the scarcity of indium. Multi-junction solar cells allow better spectral utilization of the light spectrum, while the required current generation per layer is much lower, allowing much...
conference paper 2016
document
van de Burgt, Y. (author), van Loon, W. (author), Mandamparambil, R. (author), Bellouard, Y. (author)
The localized growth of carbon nanotube structures has potential in many applications such as interconnects, field emitters and sensors. Using a laser to locally heat the substrate offers a highly versatile process compatible with a broad range of substrates and devices. However, for laser-assisted CNT growth, detailed process information, such...
article 2014
document
Van Assche, F.J.H. (author), Unnikrishnan, S. (author), Michels, J.J. (author), van Mol, A.M.B. (author), van de Weijer, P. (author), van de Sanden, M.C.M. (author), Creatore, M. (author)
We report on a low substrate temperature (110°C) remote microwave plasma-enhanced chemical vapor deposition (PECVD) process of silicon nitride barrier layers against moisture permeation for organic light emitting diodes (OLEDs) and other moisture sensitive devices such as organic photovoltaic cells (OPVs). Specifically, the influence of the SiH4...
article 2014
document
Illiberi, A. (author), Grob, F. (author), Kniknie, B. (author), Frijters, C. (author), van Deelen, J. (author), Poodt, P. (author), Beckers, E.H.A. (author), Bolt, P.J. (author)
ZnO films have been grown on a moving glass substrate by high temperature (480 0C) chemical vapour deposition (CVD) and low temperature (200 0C) plasma enhanced CVD (PE-CVD) process at atmospheric pressure. Deposition rates above 7 nm/s have been achieved for substrate speeds from 20 to 500 mm/min. The conductivity of the films is enhanced by Al...
article 2014
document
van de Burgt, Y. (author)
Laser-assisted chemical vapor deposition (LACVD) is an attractive maskless process for growing locally carbon nanotubes at selected places on substrates that may contain temperature-sensitive components. This review gives a comprehensive overview of the reported research with respect to laser assisted CVD for the growth of carbon nanotubes. The...
article 2014
document
van de Burgt, Y. (author), Bellouard, Y. (author), Mandamparambil, R. (author)
Laser-assisted chemical vapour deposition (CVD) growth is an attractive mask-less process for growing locally aligned carbon nanotubes (CNTs) in selected places on temperature sensitive substrates. The nature of the localized process results in fast carbon nanotube growth with high experimental throughput. Here, we report on the detailed...
article 2014
document
Illiberi, A. (author), Grob, F. (author), Frijters, C. (author), Poodt, P. (author), Ramachandra, R. (author), Winands, H. (author), Simor, M. (author), Bolt, P.J. (author)
Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma-enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ∼7 nm/s are achieved at low temperature (200°C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in the visible range (90%). By a short (∼minute)...
article 2013
document
van de Burgt, Y. (author), Champion, A. (author), Bellouard, Y. (author)
Carbon nanotube assemblies can be used for specific applications such as sensors and filters. We present a method and proof-of-concept to directly grow vertically-aligned carbon nanotube structures within sealed enclosures by means of a feedback-controlled laser-assisted chemical vapor deposition technique. The process is compatible with a...
article 2013
document
van Deelen, J. (author), Illiberi, A. (author), Kniknie, B.J. (author), Steijvers, H.L.A.H. (author), Lankhorst, A.M. (author), Simons, P.J.P.M. (author)
Atmospheric pressure chemical vapor deposition (APCVD) of ZnO from diethyl zinc (DEZn) and t-butanol was performed using an industrial reactor design. Deposition profiles were recorded to gain insight in the position dependent variations in layer thickness in such a reactor. We observed that for a deposition temperature below 400 °C most of the...
article 2013
document
Abadjieva, E. (author), van der Heijden, A.E.D.M. (author), Creyghton, Y.L.M. (author), van Ommen, J.R. (author)
Fluorocarbon coatings have been deposited on micron-sized silica particles by means of atmospheric pressure plasma-enhanced chemical vapor deposition (PECVD). The silica particles have a diameter in the range between 40 and 70 ?m. They are fluidized at atmospheric pressure in a circulating fluidized bed combined with a dielectric barrier...
article 2012
document
Illiberi, A. (author), Kniknie, B. (author), van Deelen, J. (author), Steijvers, H.L.A.H. (author), Habets, D. (author), Simons, P.J.P.M. (author), Janssen, A.C. (author), Beckers, E.H.A. (author)
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. Tertiary-butanol has been used as oxidant for diethylzinc and trimethylaluminium as dopant gas. ZnOx:Al films can be grown at very high deposition rates of ~14 nm/s...
article 2011
document
de Graaf, A. (author), van Deelen, J. (author), Poodt, P.W.G. (author), van Mol, A.M.B. (author), Spee, C.I.M.A. (author), Grob, F. (author), Kuypers, A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is shown that by combining precursor development, fundamental gas phase and surface chemistry studies,...
conference paper 2010
document
Akesso, L. (author), Pettitt, M.E. (author), Callow, J.A. (author), Callow, M.E. (author), Stallard, J. (author), Teer, D. (author), Liu, C. (author), Wang, S. (author), Zhao, Q. (author), D'Souza, F. (author), Willemsen, P.R. (author), Donnelly, G.T. (author), Donik, C. (author), Kocijan, A. (author), Jenko, M. (author), Jones, L.A. (author), Guinaldo, P.C. (author), TNO Industrie en Techniek (author)
SiOx-like coatings were deposited on glass slides from a hexamethylsiloxane precursor by plasma-assisted CVD (PACVD). Surface energies (23.1-45.7 mJ m-1) were correlated with the degree of surface oxidation and hydrocarbon contents. Tapping mode AFM revealed a range of surface topologies with Ra values 1.55-3.16 nm and RMS roughness 1.96-4.11 nm...
article 2009
document
van Deelen, J. (author), van Mol, A.M.B. (author), Poodt, P.W.G. (author), Grob, F. (author), Spee, C.I.M.A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is...
conference paper 2009
document
van Deelen, J. (author), Bauhuis, G.J. (author), Schermer, J.J. (author), Mulder, P. (author), Haverkamp, E.J. (author), Larsen, P.K. (author), TNO Industrie en Techniek (author)
article 2007
document
Lankhorst, A.M. (author), Paarhuis, B.D. (author), Terhorst, H.J.C.M. (author), Simons, P.J.P.M. (author), Kleijn, C.R. (author), TNO Industrie en Techniek (author)
For a large multi-wafer vertical batch ALD reactor, transient, 3-dimensional, multi-scale simulations have been performed for the TEMAH pulse step during a HfO2 ALD process. A bi-directional, multi-scale coupling has been established between continuum reactor scale simulations and molecular trench scale simulations. For describing the molecular...
article 2007
document
van Veggel, A.A. (author), Rosielle, P.C.J.N. (author), Nijmeijer, H. (author), Wielders, A.A. (author), Vink, H.J.P. (author), TNO Industrie en Techniek (author)
Due to the 10 microarcsecond accuracy, with which Gaia will measure the positions of stars using 2 astrometric telescopes, stability requirements on the payload module are extremely stringent. In order to achieve the required 10 microarcsecond accuracy, a metrology system could be installed on the satellite to monitor variations on the basic...
conference paper 2005
document
van Deelen, J. (author), Bauhuis, G.J. (author), Schermer, J.J. (author), Larsen, P.K. (author), TNO Industrie en Techniek (author)
Intrinsically carbon doped AlxGa1-xAs was grown by metalorganic chemical vapor deposition (MOCVD). The influence of the growth temperature, the V/III ratio and the aluminum fraction on the carbon, hydrogen, oxygen and aluminum incorporation was investigated over a wide parameter range. Secondary ion mass spectroscopy (SIMS) analysis was...
article 2005
Searched for: subject%3A%22Chemical%255C%2Bvapor%255C%2Bdeposition%22
(1 - 20 of 23)

Pages

List view
Grid view