Searched for: subject%3A%22CVD%22
(1 - 20 of 24)

Pages

List view
Grid view
document
Blanker, J. (author), Vroon, Z.A.E.P. (author), Zeman, M. (author), Smets, A. (author)
Copper-indium-gallium-di-selenide (CIGS) is the present record holder in lab-scale thin-film photovoltaics (TF-PV). One of the problems of this PV technology is the scarcity of indium. Multi-junction solar cells allow better spectral utilization of the light spectrum, while the required current generation per layer is much lower, allowing much...
conference paper 2018
document
Blanker, J. (author), Vroon, Z. (author), Zeman, M. (author), Smets, A. (author)
Copper-indium-gallium-di-selenide (CIGS) is the present record holder in lab-scale thin-film photovoltaics (TFPV). One of the problems of this PV technology is the scarcity of indium. Multi-junction solar cells allow better spectral utilization of the light spectrum, while the required current generation per layer is much lower, allowing much...
conference paper 2016
document
Perrotta, A. (author), García, S.J. (author), Michels, J.J. (author), Andringa, A.M. (author), Creatore, M. (author)
Water permeation in inorganic moisture permeation barriers occurs through macroscale defects/pinholes and nanopores, the latter with size approaching the water kinetic diameter (0.27 nm). Both permeation paths can be identified by the calcium test, i.e., a time-consuming and expensive optical method for determining the water vapor transmission...
article 2015
document
Illiberi, A. (author), Poodt, P. (author), Roozeboom, F. (author)
The industrial need for high-throughput and low-cost ZnO deposition processes has triggered the development of atmospheric vapor-phase deposition techniques which can be easily applied to continuous, in-line manufacturing. While atmospheric CVD is a mature technology, new processes for the growth of transparent conductive oxides on thermally...
article 2014
document
van de Burgt, Y. (author), Bellouard, Y. (author)
Carbon nanotube assemblies can be used for specific applications such as sensors and filters. We present a method and proof-of-concept to directly grow vertically-aligned carbon nanotube structures within sealed enclosures by means of a feedback-controlled laser-assisted chemical vapor deposition technique. The process is compatible with a...
conference paper 2014
document
Mannie, G.J.A. (author), van Deelen, J. (author), Niemantsverdriet, J.W. (author), Thüne, P.C. (author)
Nucleation and morphology development during the early stages of chemical vapor deposition (CVD) processes are believed to be of major importance for the overall film properties. Here, the authors have investigated the nucleation of tin oxide films, comparing different tin precursors (tin tetrachloride (TTC) and monobutyl tin trichloride (MBTC))...
article 2014
document
van Deelen, J. (author), Illiberi, A. (author), Kniknie, B. (author), Beckers, E.H.A. (author), Simons, P.J.P.M. (author), Lankhorst, A. (author)
The deposition of zinc oxide has been performed by atmospheric pressure chemical vapor deposition and trends in growth rates are compared with the literature. Diethylzinc and tertiary butanol were used as the primary reactants and deposition rates above 800 nm/min were obtained. The reaction kinetics were studied and detailed process modeling...
article 2014
document
van de Burgt, Y. (author)
Laser-assisted chemical vapor deposition (LACVD) is an attractive maskless process for growing locally carbon nanotubes at selected places on substrates that may contain temperature-sensitive components. This review gives a comprehensive overview of the reported research with respect to laser assisted CVD for the growth of carbon nanotubes. The...
article 2014
document
van de Burgt, Y. (author), Bellouard, Y. (author), Mandamparambil, R. (author)
Laser-assisted chemical vapour deposition (CVD) growth is an attractive mask-less process for growing locally aligned carbon nanotubes (CNTs) in selected places on temperature sensitive substrates. The nature of the localized process results in fast carbon nanotube growth with high experimental throughput. Here, we report on the detailed...
article 2014
document
van Deelen, J. (author), Illiberi, A. (author), Kniknie, B. (author), Beckers, E.H.A. (author), Simons, P.J.P.M. (author), Lankhorst, A. (author)
The deposition of zinc oxide has been performed by atmospheric pressure chemical vapor deposition and trends in growth rates are compared with the literature. Diethylzinc and tertiary butanol were used as the primary reactants and deposition rates above 800 nm/minwere obtained. The reaction kineticswere studied and detailed process modeling...
article 2013
document
Verweij, L.M. (author), Proper, K.I. (author), Weel, A.N.H. (author), Hulshof, C.T.J. (author), van Mechelen, W. (author)
Objective This study aims to evaluate the effectiveness of a draft occupational health guideline, aimed at preventing weight gain, on employees' body weight-related outcomes, cardiovascular disease (CVD) risk factors, and quality of life. Methods In a cluster randomized controlled trial including 16 occupational physicians (OP) and 523 employees...
article 2013
document
van Deelen, J. (author), Illiberi, A. (author), Kniknie, B.J. (author), Steijvers, H.L.A.H. (author), Lankhorst, A.M. (author), Simons, P.J.P.M. (author)
Atmospheric pressure chemical vapor deposition (APCVD) of ZnO from diethyl zinc (DEZn) and t-butanol was performed using an industrial reactor design. Deposition profiles were recorded to gain insight in the position dependent variations in layer thickness in such a reactor. We observed that for a deposition temperature below 400 °C most of the...
article 2013
document
Abadjieva, E. (author), van der Heijden, A.E.D.M. (author), Creyghton, Y.L.M. (author), van Ommen, J.R. (author)
Fluorocarbon coatings have been deposited on micron-sized silica particles by means of atmospheric pressure plasma-enhanced chemical vapor deposition (PECVD). The silica particles have a diameter in the range between 40 and 70 ?m. They are fluidized at atmospheric pressure in a circulating fluidized bed combined with a dielectric barrier...
article 2012
document
van Deelen, J. (author), Kniknie, B.J. (author), Grob, F.T.J. (author), Volintiru, I. (author), Roozeboom, F. (author), Poodt, P.W.G. (author), Illiberi, A. (author)
Transparent conductive oxide (TCO) coated glass is widely used in thin film PV. Atmospheric pressure chemical vapor deposition (APCVD) is a highly cost effective method of deposition and apart from metal precursor and oxygen precursor, other additives can improve the layer quality. In this contribution, we present an overview of the latest...
conference paper 2012
document
van Deelen, J. (author), Kniknie, B.J. (author), Steijvers, H.L.A.H. (author), Mannie, G. (author), Thune, P. (author), Illiberi, A. (author)
Atmospheric pressure CVD (APCVD) is a highly cost effective method of depositing transparent conductive oxides (TCOs). In this work, insights in alcohol addition in the widely applied SnO2 process are discussed, including high resolution TEM images. Furthermore, the APCVD process of ZnO:Al was demonstrated on an industrial moving belt APCVD...
conference paper 2012
document
Illiberi, A. (author), Kniknie, B. (author), van Deelen, J. (author), Steijvers, H.L.A.H. (author), Habets, D. (author), Simons, P.J.P.M. (author), Janssen, A.C. (author), Beckers, E.H.A. (author)
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. Tertiary-butanol has been used as oxidant for diethylzinc and trimethylaluminium as dopant gas. ZnOx:Al films can be grown at very high deposition rates of ~14 nm/s...
article 2011
document
Theelen, M.J. (author), Kouijzer, S. (author), Timmer, K. (author), Winands, G.J.J. (author), Poodt, P.W.G. (author), TNO Industrie en Techniek (author)
conference paper 2010
document
Winands, G.J.J. (author), Theelen, M.J. (author), Kouijzer, S. (author), van Deelen, J. (author), de Graaf, A. (author), Poodt, P.W.G. (author), Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, Netherlands (author)
conference paper 2010
document
de Graaf, A. (author), van Deelen, J. (author), Poodt, P.W.G. (author), van Mol, A.M.B. (author), Spee, C.I.M.A. (author), Grob, F. (author), Kuypers, A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is shown that by combining precursor development, fundamental gas phase and surface chemistry studies,...
conference paper 2010
document
van Deelen, J. (author), van Mol, A.M.B. (author), Poodt, P.W.G. (author), Grob, F. (author), Spee, C.I.M.A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is...
conference paper 2009
Searched for: subject%3A%22CVD%22
(1 - 20 of 24)

Pages

List view
Grid view