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Mertens, B.M. (author), Weiss, M. (author), Meiling, H. (author), Klein, R. (author), Louis, E. (author), Kurt, R. (author), Wedowski, M. (author), Trenkler, H. (author), Wolschrijn, B.T. (author), Jansen, R. (author), van de Runstraat, A. (author), Moors, R. (author), Spee, C.I.M.A. (author), Plöger, S. (author), van de Kruijs, R. (author), Technisch Physische Dienst TNO - TH (author)
Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss,...
article 2004