ALD and ALE: two biotopes of a kind in atomic-scale processing

Method for removing a contamination layer by an atomic layer etching process

Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering

Klimaatakkoord: wat wordt onze target voor 2030, en hoe kunnen we dat doel halen?

On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity

Isotropic ALE of ZnO using Hacac and O2 plasma

Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain high selectivity

Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm

Atomic Layer Etching&Area-Selective Atomic Layer Deposition

Area-selective atmospheric-pressure spatial ALD of SiO2 using interleaved back-etch steps yielding selectivity > 10 nm

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Isotropic Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

Damp heat related degradation mechanisms within CIGS solar cells

Perspectives of Atomic Layer Etching and related processing

New options in advanced atomic layer processing

Schaaldierallergie en het risico op voedselallergie bij consumptie van nieuwe eiwitten [Allergy to shellfish and the risk of food allergy in consumption of new proteins]

Reconstruction of tectonic heat flow in the Rub'al-Khali basin relying on an updated crustal model

Aminobenzoate modified MgAl hydrotalcites as a novel smart additive of reinforced concrete for anticorrosion applications