- document
- Roozeboom, F. (author) public lecture 2019
- document
- Mameli, A. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2019
- document
- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
- document
-
Faraz, T. (author), Arts, K. (author), Karwal, S. (author), Knoops, H.C.M. (author), Kessels, W.M.M. (author)Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in the synthesis of nanoscale films with precise growth control. Apart from the well-established contribution of highly reactive neutral radicals towards film growth in PEALD, the ions generated by the plasma can also play a significant role. In this work, we...article 2019
- document
- Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
- document
-
Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures for large area applications. The spatial separation of the ALD half-reactions and the use of an atmospheric pressure plasma as the reactant give rise to complex surface chemistry which is...article 2019
- document
-
Mameli, A. (author), Karsulu, B. (author), Verheijen, M.A. (author), Barcones, B. (author), Macco, B. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant. The selectivity of the ALD process was studied using in situ spectroscopic ellipsometry and scanning electron microscopy, revealing improved...article 2019
- document
- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) conference paper 2018
- document
-
Zardetto, V. (author), Senes, A. (author), Najafi, M. (author), Zhang, D. (author), Joly, R. (author), Chippari, M. (author), Arneouts, T. (author), Poodt, P. (author), Veenstra, S. (author), Andriessen, R. (author)In order to bring the organo-lead halide perovskite solar cells (PSC) towards the commercialization, the device stability needs to be drastically improved. Our approach relies on the introduction of a compact metal oxide (MeO) layer in a p-i-n planar architecture by means of atmospheric pressure spatial atomic layer deposition (s-ALD) technique....conference paper 2018
- document
-
Illiberi, A. (author), Katsouras, I. (author), Gazibegovic, S. (author), Cobb, B. (author), Nekovic, E. (author), van Boekel, W. (author), Frijters, C. (author), Maas, J. (author), Roozeboom, F. (author), Creyghton, Y. (author), Gelinck, G. (author)In this manuscript, the authors investigate the growth of indium zinc oxide, indium zinc oxide (InZnO, IZO) as a channel material for thin-film transistors. IZO is grown at atmospheric pressure and a high deposition rate using spatial atomic layer deposition (S-ALD). By varying the ratio of diethylzinc and trimethylindium vapor, the In/(In þ Zn)...article 2018
- document
- Mameli, A. (author), Karasulu, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
- document
-
Najafi, M. (author), Zardetto, V. (author), Zhang, D. (author), Koushik, D. (author), Dorenkamper, M.S. (author), Creatore, M. (author), Andriessen, R. (author), Poodt, P. (author), Veenstra, S. (author)The replacement of the conventional top metal contact with a semi-transparent conducting electrode such as sputtered indium-tin oxide (ITO) is strictly required to adopt the perovskite solar cell (PSC) in hybrid tandem photovoltaic applications. In order to prevent sputtering damages on the perovskite absorber and the organic materials adopted...article 2018
- document
-
Wu, Y. (author), Giddings, A.D. (author), Verheijen, M.A. (author), Macco, B. (author), Prosa, T.J. (author), Larson, D.J. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the threedimensional distribution of Al atoms in the ZnO host material matrix has been examined on the atomic scale using a...article 2018
- document
-
Petruzella, M. (author), Zobenica, Z. (author), Cotrufo, M. (author), Zardetto, V. (author), Mameli, A. (author), Pagliano, F. (author), Koelling, S. (author), van Otten, F.W.M. (author), Roozeboom, F. (author), Kessels, W.M.M. (author), van der Heijden, R.W. (author), Fiore, A. (author)A method to avoid the stiction failure in nano-electro-opto-mechanical systems has been demonstrated by coating the system with an anti-stiction layer of Al2O3 grown by atomic layer deposition techniques. The device based on a double-membrane photonic crystal cavity can be reversibly operated from the pull-in back to its release status. This...article 2018
- document
- conference paper 2017
- document
-
Poodt, P.W.G. (author), Mameli, A. (author), Schulpen, J.J.P.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer deposition (ALD) is renowned for its step coverage in porous substrates. Several emerging applications require a combination of this high step coverage with high throughput ALD, like spatial ALD. Often, high throughput ALD is performed at atmospheric pressure, and therefore, the effect of reactor pressure on the saturation dose is...article 2017
- document
- Mameli, A. (author), Karasulu, B. (author), Barcones, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2017
- document
-
Ahvenniemi, E. (author), Akbashev, A.R. (author), Ali, S. (author), Bechelany, M. (author), Berdova, M. (author), Boyadjiev, S. (author), Cameron, D.C. (author), Chen, R. (author), Chubarov, M. (author), Cremers, V. (author), Devi, A. (author), Drozd, V. (author), Elnikova, L. (author), Gottardi, G. (author), Grigoras, K. (author), Hausmann, D.M. (author), Seong Hwang, C. (author), Jen, S.H. (author), Kallio, T. (author), Kanervo, J. (author), Khmelnitskiy, I. (author), Kim, D.H. (author), Klibanov, L. (author), Koshtyal, Y. (author), Krause, A.O.I. (author), Kuhs, J. (author), Kärkkänen, I. (author), Kääriäinen, M.L. (author), Kääriäinen, T. (author), Lamagna, L. (author), Łapicki, A.A. (author), Leskelä, M. (author), Lipsanen, H. (author), Lyytinen, J. (author), Malkov, A. (author), Malygin, A. (author), Mennad, A. (author), Militzer, C. (author), Molarius, J. (author), Norek, M. (author), Özgit-Akgün, Ç. (author), Panov, M. (author), Pedersen, H. (author), Piallat, F. (author), Popov, G. (author), Puurunen, R.L. (author), Rampelberg, G. (author), Ras, R.H.A. (author), Rauwel, E. (author), Roozeboom, F. (author), Sajavaara, T. (author), Salami, H. (author), Savin, H. (author), Schneider, N. (author), Seidel, T.E. (author), Sundqvist, J. (author), Suyatin, D.B. (author), Törndahl, T. (author), van Ommen, J.R. (author), Wiemer, C. (author), Ylivaara, O.M.E. (author), Yurkevich, O. (author)Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...article 2017
- document
- Frijters, C. (author), van den Bruele, F. (author), Grob, F. (author), Illiberi, A. (author), Creyghton, Y. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2017
- document
- Illiberi, A. (author), Katsouras, I. (author), Gazibegovic, S. (author), Cobb, B. (author), Nekovic, E. (author), van Boekel, W. (author), Frijters, C. (author), Maas, J. (author), Roozeboom, F. (author), Creyghton, Y. (author), Poodt, P. (author), Gelinkck, G. (author) public lecture 2017