Area selective atomic layer deposition method and tool

Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage

Atmospheric Pressure Plasma Assisted Spatial ALD of Silicon Nitride

High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity

A method of manufacturing a semi-conducting thin film device

Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor

High Throughput Area Selective Spatial ALD with Interleaved Etching Steps for Low Defectivity

Spatial Atomic Layer Deposition for large area and flexible electronics

ALD and ALE: two biotopes of a kind in atomic-scale processing

Area-selective spatial ALD of SiO2 interleaved with back-etch corrections: Selectivity and surface inspection of non-growth area

Area selective atomic layer deposition method and tool

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering

Next-Generation Li-ion Batteries Made with Spatial Atomic Layer Deposition as an Enabling Technology

On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity

Large-Area Atmospheric-Pressure Spatial ALD enabling All-Solid-State 3D Batteries with Ultrathin LiPON and High-Capacity Electrodes

Isotropic ALE of ZnO using Hacac and O2 plasma

Overview of doctoral theses on Atomic Layer Deposition collected in the Virtual Project on the History of ALD

Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain high selectivity

Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm