document

Chemical metrology on latent resist images

van Es, M.H. (author), Tamer, S. (author), Bloem, E. (author), Fillinger, L. (author), van Zeijl, E. (author), Maturová, K. (author), van der Donck, J.C.J. (author), Willekers, R.W. (author), Chuang, C.B. (author), Maas, D.J. (author)

Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. However, how can the activation of modern complex resist components be accurately measured at sufficient spatial resolution? No exposed nanometre-scale resist pattern is sufficiently sturdy to unalteredly withstand...

article 2023

document

Demonstration of atomic force microscopy imaging using an integrated opto-electro-mechanical transducer

Galeotti, F. (author), Lindgren, G. (author), Petruzzella, M. (author), van Otten, F.W.M. (author), Sadeghian Marnani, H. (author), Mohtashami, A. (author), van der Heijden, R. (author), Fiore, A. (author)

The low throughput of atomic force microscopy (AFM) is the main drawback in its large-scale deployment in industrial metrology. A promising solution would be based on the parallelization of the scanning probe system, allowing acquisition of the image by an array of probes operating simultaneously. A key step for reaching this goal relies on the...

article 2021

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Real-Time Estimation of the Tip-Sample Interactions in Tapping Mode Atomic Force Microscopy with a Regularized Kalman Filter

Keyvani Janbahan, A. (author), van der Veen, G. (author), Tamer, M.S. (author), Sadeghian Marnani, H. (author), Goosen, H. (author), van Keulen, F. (author)

The real-time and accurate measurement of tip-sample interaction forces in Tapping Mode Atomic Force Microscopy (TM-AFM) is a remaining challenge. This obstruction fundamentally stems from the causality of the physical systems. Since the input of the dynamic systems propagates to the output with some delay, and multiple different inputs can...

article 2020

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First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology

Witvoet, G. (author), Peters, J. (author), Kuiper, S. (author), Keyvani, S. (author), Willekers, R.W. (author)

TNO is developing a novel Large Dynamic Range Atomic Force Microscope (LDR-AFM), primarily but not exclusively designed for sub-nm accurate overlay metrology. The LDR-AFM combines an AFM with a 6 degrees- of-freedom interferometric positioning stage, thereby enabling measurements of sub-nm features on a wafer over multiple millimeters marker-to...

conference paper 2019

document

Deep subsurface imaging with subsurface probe micro-scopy @ GHZ

van Neer, P.L.M.J. (author), van Es, M.H. (author), Piras, D. (author), Navarro, V. (author), Mohtashami, A. (author), van der Lans, M.J. (author), Sadeghian Marnani, H. (author)

This work details the initial simulation and experimental GHz SPM work carried out at TNO.

other 2019

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A comprehensive model for transient behavior of tapping mode atomic force microscope

Keyvani Janbahan, A. (author), Tamer, M.S. (author), van Wingerden, J.W. (author), Goosen, J.F.L. (author), van Keulen, F. (author)

Many investigations have focused on steady-state nonlinear dynamics of cantilevers in tapping mode atomic force microscopy (TM-AFM). However, a transient dynamic model?which is essential for a model-based control design?is still missing. In this paper, we derive a mathematical model which covers both the transient and steady-state behavior. The...

article 2019

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Results from the Large Dynamic Range Atomic Force Microscope

Peters, J. (author), Herfst, R.W. (author), Witvoet, G. (author), Kuiper, S. (author), van Es, M.H. (author), Willekers, R.W. (author)

TNO developed a novel Large Dynamic Range Atomic Force Microscope (LDRAFM), designed for sub-nm accurate metrology. The current work provides an overview of recent developments and presents the results obtained after final integration of the complete system. Results indicate impressive stability over long range, enabling subnm metrology...

other 2019

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Towards Quantitative Stiffness based Subsurface AFM

Piras, D. (author), Fillinger, L. (author), Rajadurai, S.R.S. (author), van Es, M.H. (author), van der Lans, M.J. (author)

In order to make stiffness based subsurface AFM a quantitative imaging modality, the experimental subsurface measurement must be interpreted with a versatile forward (and inverse) model. We have developed a fully parametric finite element model framework for the quantification of critical dimensions relevant in semicon applications. After...

other 2019

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Improved sub-surface AFM using photothermal excitation

van Reijzen, M.E. (author), Tamer, M.S. (author), van Es, M.H. (author), van Riel, M.C.J.M. (author), Keyvani Janbahan, A. (author), Sadeghian Marnani, S. (author), van der Lans, M.J. (author)

In this paper, we present an AFM based subsurface measurement technique that can be used for overlay and critical dimensions (CD) measurements through optically opaque layers. The proposed method uses the surface elasticity map to resolve the presence and geometry of subsurface structures. To improve the imaging performance of the AFM based...

conference paper 2019

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Improved sub-surface AFM using photothermal excitation

Keyvani Janbahan, A. (author), van Reijzen, M.E. (author), Tamer, M.S. (author), van Es, M.H. (author), van Riel, M.C.J.M. (author), Sadeghian Marnani, S. (author), van der Lans, M.J. (author)

public lecture 2019

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On the origin of amplitude reduction mechanism in tapping mode atomic force microscopy

Keyvani Janbahan, A. (author), Sadeghian Marnani, H. (author), Goosen, H. (author), van Keulen, F. (author)

The origin of amplitude reduction in Tapping Mode Atomic Force Microscopy (TM-AFM) is typically attributed to the shift in resonance frequency of the cantilever due to the nonlinear tip-sample interactions. In this paper, we present a different insight into the same problem which, besides explaining the amplitude reduction mechanism, provides a...

article 2018

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Automated cantilever exchange and optical alignment for high-throughput parallel Atomic Force Microscopy

Sadeghian Marnani, H. (author), Bijnagte, A.A. (author), Herfst, R.W. (author), Kramer, G.F.IJ. (author), Kramer, L. (author), Dekker, A. (author)

In atomic force microscopy (AFM), the exchange and alignment of the AFM cantilever with respect to the optical beam and position-sensitive detector (PSD) are often performed manually. This process is tedious and time consuming, and sometimes damages the cantilever or tip. To increase the throughput of AFM in industrial applications, the ability...

article 2017

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Analysis of contact stiffness in ultrasound atomic force microscopy: three-dimensional time-dependent ultrasound modeling

Piras, D. (author), Sadeghian Marnani, H. (author)

Ultrasound atomic force microscopy (US-AFM) has been used for subsurface imaging of nanostructures. The contact stiffness variations have been suggested as the origin of the image contrast. Therefore, to analyze the image contrast, the local changes in the contact stiffness due to the presence of subsurface features should be calculated. So far,...

article 2017

document

Simultaneous AFM nano-patterning and imaging for photomask repair

Keyvani, A. (author), Tamer, M.S. (author), van Es, M.H. (author), Sadeghian Marnani, H. (author)

In this paper we present a new AFM based nano-patterning technique that can be used for fast defect repairing of high resolution photomasks and possibly other high-speed nano-patterning applications. The proposed method works based on hammering the sample with tapping mode AFM followed by wet cleaning of the residuals. On the area where a...

conference paper 2016

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Large dynamic range Atomic Force Microscope for overlay improvements

Kuiper, S. (author), Fritz, E.C. (author), Crowcombe, W.E. (author), Liebig, T. (author), Kramer, G.F.I. (author), Witvoet, G. (author), Duivenvoorde, T. (author), Overtoom, A.J. (author), Rijnbeek, R.A. (author), van Zwet, E.J. (author), van Dijsseldonk, A. (author), den Boef, A. (author), Beems, M. (author), Levasier, L. (author)

Nowadays most overlay metrology tools assess the overlay performance based on marker features which are deposited next to the functional device features within each layer of the semiconductor device. However, correct overlay of the relatively coarse marker features does not directly guarantee correct overlay of the much smaller device features....

conference paper 2016

document

EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution

van Es, M.H. (author), Sadeghian Marnani, H. (author)

Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1nm true 3D resolution over the entire surface. The limiting factor to do this is in the sensor itself:...

conference paper 2016

document

Piezoelectricity enhancement of P(VDF/TrFE) by X-ray irradiation

Pilet, N. (author), Khikhlovskyi, V. (author), van Breemen, A.J.J.M. (author), Michels, J.J. (author), Kemerink, M. (author), Gelinck, G. (author), Warnicke, P. (author), Bernard, L. (author)

Organic electronics is becoming more and more important because the low level of fabrication and deposition complexity even at large scale makes it a good candidate for future low cost technological product development. P(VDF-TrFE) is a co-polymer of special interest due its ferroelectric property enabling usage in re-programmable non-volatile...

article 2016

document

Fast solidification kinetics of parts of bituminous binders

Fischer, H.R. (author), Dillingh, B. (author), Ingenhut, B. (author)

A quantification of the kinetics of formation of the micro-phases in bitumen during cooling as it occurs in applications, e.g. a road pavement will enable a better prediction of the performance of asphalt in models and an understanding of functional properties and their development in time. This microphase formation is part of the process of...

article 2016

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High-speed AFM for 1x node metrology and inspection: Does it damage the features?

Sadeghian Marnani, H. (author), van den Dool, T.C. (author), Uziel, Y. (author), Bar Or, R. (author)

This paper aims at unraveling the mystery of damage in high speed AFMs for 1X node and below. With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D,...

conference paper 2015

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Transient Tip-Sample Interactions in High-Speed AFM Imaging of 3D nano structures

Keyvani Janbahan, A. (author), Sadeghian Marnani, H. (author), Goosen, H. (author), van Keulen, F. (author)

The maximum amount of repulsive force applied to the surface plays a very important role in damage of tip or sample in Atomic Force Microscopy(AFM). So far, many investigations have focused on peak repulsive forces in tapping mode AFM in steady state conditions. However, it is known that AFM could be more damaging in transient conditions. In...

conference paper 2015