Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11

Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences

Semiconductor Wafer Bonding: Science, Technology, and Applications 16

Silicon Compatible Emerging Materials,Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 10

Silicon Compatible Emerging Materials,Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9

Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 8

Traditionally, the topics of this annual symposium focus upon the continuous scaling in CMOS integrated circuit manufacturing (More Moore and Beyond Moore for short) combined with the opportunities from growing diversification including sensors and embedded functionality (More than Moore). Thus, the main objective is to exchange recent advances...

Atomic Layer Deposition Applications 13

Preface

Air Liquide; Applied Materials; Dielectric Science and Technology; Electronics and Photonics; et al.; Gelest

Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 7

On the Growth, Percolation and Wetting of Silver Thin Films Grown by Atmospheric-Plasma Enhanced Spatial Atomic Layer Deposition

In this work we studied the deposition of silver (Ag) by spatial-ALD on molybdenum layers serving as a growth model substrate. Mo-layers were selected for testing the suitability of spatial-ALD in fabricating MoO3/Ag/MoO3 tri-layer transparent conductor (TC) stacks used for light-management optimization in organic-based and perovskites solar...

Atomic Layer Deposition Applications 12

Plasma-Enhanced Atmospheric-Pressure Spatial ALD of Al2O3 and ZrO2

Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH,...