- document
-
Last, T. (author), Samkharadze, N. (author), Eendebak, P.T. (author), Versluis, R. (author), Xue, X. (author), Sammak, A. (author), Brousse, D. (author), Loh, K.K.L. (author), Polinder, H. (author), Scappucci, G. (author), Veldhorst, M. (author), Vandersypen, L. (author), Maturová, K. (author), Veltin, J. (author), Alberts, G.J.N. (author)The mission of QuTech is to bring quantum technology to industry and society by translating fundamental scientific research into applied research. To this end we are developing Quantum Inspire (QI), a full-stack quantum computer prototype for future co-development and collaborative R&D in quantum computing. A prerelease of this prototype system...conference paper 2020
- document
-
Navarro, V. (author), Mohtashami, A. (author), Herfst, R.W. (author), Maturova, K. (author), van Es, M.H. (author), Piras, D. (author), Sadeghian Marnani, H. (author)As the pitch approaches the 10nm node, in order to meet current and future patterning challenges, high resolution techniques are required, complementary to extreme ultraviolet lithography (EUVL) for high volume manufacturing of nanodevices. These complementary techniques should have the following specifications: 1) High patterning resolution,...conference paper 2018
- document
-
Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...conference paper 2017
- document
-
van Veldhoven, J. (author), Huijser, T. (author), Nieuwkoop, E. (author), van Putten, M. (author), Koster, N.B. (author), Maas, D.J. (author)A reproducible measurement of in-band EUV power over time is essential in EUV lithography, e.g. for dose control, for monitoring the transmission of (parts of) the optical path and for detecting changes in EUV source performance. However, all currently available sensors suffer from sensitivity degradation over time due to photon-induced...conference paper 2016
- document
-
van Veldhoven, J. (author), Huijser, T. (author), Nieuwkoop, E. (author), van Putten, M. (author), Koster, N.B. (author), Maas, D.J. (author)A reproducible measurement of in-band EUV power over time is essential in EUV lithography, e.g. for dose control, monitoring the transmission of (parts of) the optical path and detecting changes in EUV source performance. However, all currently available sensors suffer from sensitivity degradation over time due to photon-induced contamination...public lecture 2016
- document
-
Zoldesi, C.I. (author), Bal, K. (author), Blum, B. (author), Bock, G. (author), Brouns, D. (author), Dhalluin, F. (author), Dziomkina, N. (author), Arias Espinoza, J.D. (author), de Hoogh, J. (author), Houweling, S. (author), Jansen, M. (author), Kamali, M. (author), Kempa, A. (author), Kox, R. (author), de Kruif, R. (author), Lima, J. (author), Liu, Y. (author), Meijer, H. (author), Meiling, H. (author), van Mil, I. (author), Reijnen, M. (author), Scaccabarozzi, L. (author), Smith, D. (author), Verbrugge, B. (author), de Winter, L. (author), Xiong, X. (author), Zimmerman, J. (author)As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume...conference paper 2014