Large-area spatial atmospheric ALD: Al2O3 in a Gen-1 sheet-to-sheet prototype tool

Up-scaling perovskite solar cell manufacturing from sheet-to-sheet to roll-to-roll: Challenges and solutions

Organometallic halide perovskite solar cells (PSCs) are extremely promising novel materials for thin-film photovoltaics, exhibiting efficiencies over 22% on glass and over 17% on foil 1, 2. First, a sheet-to-sheet (S2S) production of PSCs and modules on 152x152 mm2 substrates was established, using a combination of sputtering, e-beam evaporation...

On the Growth, Percolation and Wetting of Silver Thin Films Grown by Atmospheric-Plasma Enhanced Spatial Atomic Layer Deposition

In this work we studied the deposition of silver (Ag) by spatial-ALD on molybdenum layers serving as a growth model substrate. Mo-layers were selected for testing the suitability of spatial-ALD in fabricating MoO3/Ag/MoO3 tri-layer transparent conductor (TC) stacks used for light-management optimization in organic-based and perovskites solar...

Plasma-Enhanced Atmospheric-Pressure Spatial ALD of Al2O3 and ZrO2

Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH,...

Developments in plasma enhanced spatial ALD for high throughput applications [3.04]

Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with...

Cyclic Etch/Passivation-Deposition as an All-Spatial Concept toward High-Rate Room Temperature Atomic Layer Etching

Conventional (3D) etching in silicon is often based on the ‘Bosch’ plasma etch with alternating half-cycles of a directional Sietch and a fluorocarbon polymer passivation. Also shallow feature etching is often based on cycled processing. Likewise, ALD is time-multiplexed, with the extra benefit of half-reactions being self-limiting, thus...

A Spatial ALD oxide passivation module in an all-spatial etch-passivation cluster concept