Apparatus and method for reactive ion etching

The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the...

From pulsed power to processing: Plasma initiated chemical process intensification

Smart electric power for process intensification is a challenging research field that integrates power engineering, chemistry and green technology. Pulsed power technology is offering elegant solutions. This work focuses on backgrounds of matching the power source to the process. Important items are reactor impedance, chemical reactions, plasma...

Patterned deposition by plasma enhanced spatial atomic layer deposition

Local plasma deposition on polymer components

For the modification of the surface energy of polymers, organosilicon coatings provide good optical and mechanical properties and are excellent candidates for the modification of the surface energy of polymers. These coatings can be deposited by plasma polymerization of hexamethyldisiloxane (HMDSO) under atmospheric pressure and at room...

Zinc acetylacetonate as MOCVD precursor for ZnO: The effect of hydration on the evaporation behavior

Integrated shaping and finishing of polymer components

Integration of multiple functions in single components is pursued in order to manufacture at less cost smaller and smarter polymer micro devices. A method to achieve this is surface activation, i.e. fully or patterned changing of the surface properties. Examples are moulded interconnect devices with conductive surface tracks and lab-on-chip...

Deposition of zinc oxide using an atmospheric low temperature plasma process

Applications of repetitive pulsed power, research at TU/e