Searched for: author%3A%22Verheijen%2C+M.A.%22
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Rohlfs, J. (author), Bossers, K.W. (author), Meulendijks, N. (author), Valega Mackenzie, F. (author), Xu, M. (author), Verheijen, M.A. (author), Buskens, P. (author), Sastre, F. (author)
article 2022
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Burova, D. (author), Rohlfs, J. (author), Sastre, F. (author), Molina, P.M. (author), Meulendijks, N. (author), Verheijen, M.A. (author), Kelchtermans, A.S. (author), Elen, K. (author), Hardy, A. (author), van Bael, M.K. (author), Buskens, P. (author)
The preparation of Ru nanoparticles supported on γ-Al2O3 followed by chemical reduction using RuCl3 as a precursor is demonstrated, and their properties are compared to Ru nanoparticles supported on γ-Al2O3 prepared by impregnation of γ-Al2O3 with Ru3(CO)12 and subsequent thermal decomposition. The Ru nanoparticles resulting from chemical...
article 2022
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Molina, P.M. (author), Meulendijks, N. (author), Xu, M. (author), Verheijen, M.A. (author), den Hartog, T. (author), Buskens, P. (author), Sastre, F. (author)
Sunlight-powered reduction of CO2to fuels and chemicals is apromising strategy to close the carbon loop and facilitate theenergy transition. In this research, we demonstrate that Aunanoparticles supported on TiO2are an efficient plasmoniccatalyst for the sunlight-powered reverse water-gas shift (rWGS)reaction. A maximum CO production rate of429...
article 2021
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Karwal, S. (author), Verheijen, M.A. (author), Arts, K. (author), Faraz, T. (author), Kessels, W.M.M. (author), Creatore, M. (author)
In this work, we report on the atomic layer deposition (ALD) of HfNx thin films by employing CpHf(NMe2)3 as the Hf(IV) precursor and Ar–H2 plasma in combination with external RF substrate biasing as the co-reactant. Following up on our previous results based on an H2 plasma and external RF substrate biasing, here we address the effect of ions...
article 2020
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Grote, R. (author), Habets, R. (author), Rohlfs, J. (author), Sastre, F. (author), Meulendijks, N. (author), Xu, M. (author), Verheijen, M.A. (author), Elen, K. (author), Hardy, A. (author), van Bael, M.K. (author), den Hartog, T. (author), Buskens, P. (author)
article 2020
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2019
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Mameli, A. (author), Karsulu, B. (author), Verheijen, M.A. (author), Barcones, B. (author), Macco, B. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant. The selectivity of the ALD process was studied using in situ spectroscopic ellipsometry and scanning electron microscopy, revealing improved...
article 2019
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...
article 2018
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2018
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Mameli, A. (author), Karasulu, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2018
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Zardetto, V. (author), di Giacomo, F. (author), Lifka, H. (author), Verheijen, M.A. (author), Weijtens, C.H.L. (author), Black, L.E. (author), Veenstra, S. (author), Kessels, W.M.M. (author), Andriessen, R. (author), Creatore, M. (author)
Perovskite solar cells (PSCs) are emerging among the photovoltaic (PV) technologies due to their high power conversion efficiency (PCE) in combination with potentially low cost manufacturing processing. In this contribution, the fabrication of efficient planar n-i-p PSCs by the modification of the electron transport layer (ETL) adopted as n-type...
article 2018
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Wu, Y. (author), Giddings, A.D. (author), Verheijen, M.A. (author), Macco, B. (author), Prosa, T.J. (author), Larson, D.J. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)
The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the threedimensional distribution of Al atoms in the ZnO host material matrix has been examined on the atomic scale using a...
article 2018
document
Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...
article 2018
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Kuang, Y. (author), Zardetto, V. (author), van Gils, R. (author), Karwal, S. (author), Koushik, D. (author), Verheijen, M.A. (author), Black, L.E. (author), Weijtens, C. (author), Veenstra, S.C. (author), Andriessen, H.A.J.M. (author), Kessels, W.M.M. (author), Creatore, M. (author)
In this work, we present an extensive characterization of plasma-assisted atomic-layer-deposited SnO2 layers, with the aim of identifying key material properties of SnO2 to serve as an efficient electron transport layer in perovskite solar cells (PSCs). Electrically resistive SnO2 films are fabricated at 50 °C, while a SnO2 film with a low...
article 2018
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Mameli, A. (author), Karasulu, B. (author), Barcones, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2017
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
public lecture 2017
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Erkens, I.J.M. (author), Verheijen, M.A. (author), Knoops, H.C.M. (author), Keuning, W. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)
To date, conventional thermal atomic layer deposition (ALD) has been the method of choice to deposit high-quality Pt thin films grown typically from (MeCp)PtMe3 vapor and O2 gas at 300 °C. Plasma-assisted ALD of Pt using O2 plasma can offer several advantages over thermal ALD, such as faster nucleation and deposition at lower temperatures. In...
article 2017
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Mameli, A. (author), van den Bruele, F. (author), Ande, C.K. (author), Verheijen, M.A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
In this work we studied the deposition of silver (Ag) by spatial-ALD on molybdenum layers serving as a growth model substrate. Mo-layers were selected for testing the suitability of spatial-ALD in fabricating MoO3/Ag/MoO3 tri-layer transparent conductor (TC) stacks used for light-management optimization in organic-based and perovskites solar...
conference paper 2016
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Wu, Y. (author), Macco, B. (author), Vanhemel, D. (author), Koelling, S. (author), Verheijen, M.A. (author), Koenraad, P.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...
article 2016
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Williams, B.L. (author), Zardetto, V. (author), Kniknie, B. (author), Verheijen, M.A. (author), Kessels, W.M.M. (author), Creatore, M. (author)
The electrical role of the highly resistive and transparent (HRT) i-ZnO layer in Cu(In, Ga)Se2(CIGS) solar cells is investigated. By tuning the resistivity of atomic layer deposited (ALD) i-ZnO through the use of post-growth O2-plasma treatments, it is shown that low i-ZnO carrier densities (i.e. high resistivities) actually restrict the...
article 2016
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