Searched for: author%3A%22Spee%2C+C.I.M.A.%22
(1 - 10 of 10)
document
Spee, C.I.M.A. (author)
public lecture 2012
document
Poodt, P.W.G. (author), Lankhorst, A.M. (author), Roozeboom, F. (author), Spee, C.I.M.A. (author), Maas, D. (author), Vermeer, A. (author), TNO Industrie en Techniek (author)
In this Communication we show that with spatially separated ALD of Al2O3 growth rates of 1.2 nm s-1 can be achievd, showing excellent surface passivation (surface recombination velocities of <2 cm s-1). This implies a revolutionary breakthrough in industrial throughput ALD of Al2O3 passivation of silicon solar cells.
article 2010
document
de Graaf, A. (author), van Deelen, J. (author), Poodt, P.W.G. (author), van Mol, A.M.B. (author), Spee, C.I.M.A. (author), Grob, F. (author), Kuypers, A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is shown that by combining precursor development, fundamental gas phase and surface chemistry studies,...
conference paper 2010
document
van Deelen, J. (author), van Mol, A.M.B. (author), Poodt, P.W.G. (author), Grob, F. (author), Spee, C.I.M.A. (author), TNO Industrie en Techniek (author)
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is...
conference paper 2009
document
van Neer, M.K.P. (author), Spee, C.I.M.A. (author), Hovestad, A. (author), Schrauwen, C.P.G. (author), TNO Industrie en Techniek (author)
article 2008
document
Mertens, B.M. (author), Weiss, M. (author), Meiling, H. (author), Klein, R. (author), Louis, E. (author), Kurt, R. (author), Wedowski, M. (author), Trenkler, H. (author), Wolschrijn, B.T. (author), Jansen, R. (author), van de Runstraat, A. (author), Moors, R. (author), Spee, C.I.M.A. (author), Plöger, S. (author), van de Kruijs, R. (author), Technisch Physische Dienst TNO - TH (author)
Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss,...
article 2004
document
van Mol, A.M.B. (author), Driessen, J.P.A.M. (author), Linden, J.L. (author), de Croon, M.H.J.M. (author), Spee, C.I.M.A. (author), Schouten, J.C. (author), Technisch Physische Dienst TNO - TH (author)
article 2001
document
Alcott, G.R. (author), van Mol, A.M.B. (author), Spee, C.I.M.A. (author), Technisch Physische Dienst TNO - TH (author)
The potentially fast data acquisition capability and high resolution of the Fourier transform infrared (FTIR) spectrometer makes it an attractive tool for in-situ analysis of CVD systems. However, real-time extraction of useful quantitative information from the spectra recorded at medium (4 cm-1) or high (0.5 cm-1) resolution can be a difficult...
article 2000
document
TNO Bouw (author), Oversloot, H.P. (author), Spee, C.I.M.A. (author), Veenstra, A. (author)
report 1999
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Vroon, Z.A.E.P. (author), Spee, C.I.M.A. (author), Technisch Physische Dienst TNO - TH (author)
The preparation of vanadium and tungsten oxide coatings is described using vanadium oxide tri-2-propoxide/2-propanol and tungsten penta-ethoxide/2-propanol solutions. These solutions are dip coated onto K-glass substrates and cured. For vanadium oxide coatings it is shown that sol-gel/dip coat processing is a feasible production technology for...
article 1997
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