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Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures for large area applications. The spatial separation of the ALD half-reactions and the use of an atmospheric pressure plasma as the reactant give rise to complex surface chemistry which is...article 2019
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Mameli, A. (author), Karsulu, B. (author), Verheijen, M.A. (author), Barcones, B. (author), Macco, B. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant. The selectivity of the ALD process was studied using in situ spectroscopic ellipsometry and scanning electron microscopy, revealing improved...article 2019
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Illiberi, A. (author), Frijters, C. (author), Ruth, M. (author), Bermaud, D. (author), Poodt, P. (author), Roozeboom, F. (author), Bolt, J.P. (author)Zinc oxysulfide (ZnOS) is synthesized at atmospheric pressure in a laboratory-scale spatial atomic layer deposition setup by sequentially exposing the substrate to diethyl zinc and an H2O/H2S mixture, separated by a nitrogen gas curtain. The co-injection of H2O and H2S vapors in the same deposition zone enables an accurate control of the S/(O +...article 2018
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...article 2018
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- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) conference paper 2018
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
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Illiberi, A. (author), Katsouras, I. (author), Gazibegovic, S. (author), Cobb, B. (author), Nekovic, E. (author), van Boekel, W. (author), Frijters, C. (author), Maas, J. (author), Roozeboom, F. (author), Creyghton, Y. (author), Gelinck, G. (author)In this manuscript, the authors investigate the growth of indium zinc oxide, indium zinc oxide (InZnO, IZO) as a channel material for thin-film transistors. IZO is grown at atmospheric pressure and a high deposition rate using spatial atomic layer deposition (S-ALD). By varying the ratio of diethylzinc and trimethylindium vapor, the In/(In þ Zn)...article 2018
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- Mameli, A. (author), Karasulu, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
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Wu, Y. (author), Giddings, A.D. (author), Verheijen, M.A. (author), Macco, B. (author), Prosa, T.J. (author), Larson, D.J. (author), Roozeboom, F. (author), Kessels, W.M.M. (author)The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the threedimensional distribution of Al atoms in the ZnO host material matrix has been examined on the atomic scale using a...article 2018
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Petruzella, M. (author), Zobenica, Z. (author), Cotrufo, M. (author), Zardetto, V. (author), Mameli, A. (author), Pagliano, F. (author), Koelling, S. (author), van Otten, F.W.M. (author), Roozeboom, F. (author), Kessels, W.M.M. (author), van der Heijden, R.W. (author), Fiore, A. (author)A method to avoid the stiction failure in nano-electro-opto-mechanical systems has been demonstrated by coating the system with an anti-stiction layer of Al2O3 grown by atomic layer deposition techniques. The device based on a double-membrane photonic crystal cavity can be reversibly operated from the pull-in back to its release status. This...article 2018
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...article 2018
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Roozeboom, F. (author), Lankhorst, A.M. (author), Poodt, P.W.G. (author), Koster, N.B. (author), Winands, G.J.J. (author), Vermeer, A.J.P.M. (author)The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the...patent 2017
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Poodt, P.W.G. (author), Mameli, A. (author), Schulpen, J.J.P.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer deposition (ALD) is renowned for its step coverage in porous substrates. Several emerging applications require a combination of this high step coverage with high throughput ALD, like spatial ALD. Often, high throughput ALD is performed at atmospheric pressure, and therefore, the effect of reactor pressure on the saturation dose is...article 2017
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- Mameli, A. (author), Karasulu, B. (author), Barcones, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2017
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Roozeboom, F. (author), de Gendt, S. (author), Elam, J.W. (author), van der Straten, O. (author), Dendooven, J. (author), Liu, C. (author)Air Liquide; Applied Materials; Dielectric Science and Technology; Electronics and Photonics; et al.; Gelestarticle 2017
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Ahvenniemi, E. (author), Akbashev, A.R. (author), Ali, S. (author), Bechelany, M. (author), Berdova, M. (author), Boyadjiev, S. (author), Cameron, D.C. (author), Chen, R. (author), Chubarov, M. (author), Cremers, V. (author), Devi, A. (author), Drozd, V. (author), Elnikova, L. (author), Gottardi, G. (author), Grigoras, K. (author), Hausmann, D.M. (author), Seong Hwang, C. (author), Jen, S.H. (author), Kallio, T. (author), Kanervo, J. (author), Khmelnitskiy, I. (author), Kim, D.H. (author), Klibanov, L. (author), Koshtyal, Y. (author), Krause, A.O.I. (author), Kuhs, J. (author), Kärkkänen, I. (author), Kääriäinen, M.L. (author), Kääriäinen, T. (author), Lamagna, L. (author), Łapicki, A.A. (author), Leskelä, M. (author), Lipsanen, H. (author), Lyytinen, J. (author), Malkov, A. (author), Malygin, A. (author), Mennad, A. (author), Militzer, C. (author), Molarius, J. (author), Norek, M. (author), Özgit-Akgün, Ç. (author), Panov, M. (author), Pedersen, H. (author), Piallat, F. (author), Popov, G. (author), Puurunen, R.L. (author), Rampelberg, G. (author), Ras, R.H.A. (author), Rauwel, E. (author), Roozeboom, F. (author), Sajavaara, T. (author), Salami, H. (author), Savin, H. (author), Schneider, N. (author), Seidel, T.E. (author), Sundqvist, J. (author), Suyatin, D.B. (author), Törndahl, T. (author), van Ommen, J.R. (author), Wiemer, C. (author), Ylivaara, O.M.E. (author), Yurkevich, O. (author)Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...article 2017
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2017
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- Frijters, C. (author), van den Bruele, F. (author), Grob, F. (author), Illiberi, A. (author), Creyghton, Y. (author), Roozeboom, F. (author), Poodt, P. (author) public lecture 2017
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- Illiberi, A. (author), Katsouras, I. (author), Gazibegovic, S. (author), Cobb, B. (author), Nekovic, E. (author), van Boekel, W. (author), Frijters, C. (author), Maas, J. (author), Roozeboom, F. (author), Creyghton, Y. (author), Poodt, P. (author), Gelinkck, G. (author) public lecture 2017
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- Mameli, A. (author), Merkx, M. (author), Karasulu, B. (author), Roozeboom, F. (author), Kessels, W.M.M. (author), Mackus, A.J.M. (author) public lecture 2017