Area selective atomic layer deposition method and tool

Atmospheric Pressure Plasma Assisted Spatial ALD of Silicon Nitride

High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity

A method of manufacturing a semi-conducting thin film device

Area Selective Spatial Atomic Layer Deposition of Silicon Based Materials

Nano-tuning of pores in ceramic membranes

Tuning the Pore Size of Ceramic Membranes Using Atomic Layer Deposition Techniques

Atmospheric Pressure Plasma Assisted Spatial ALD of Silicon Nitride

Plasma source and surface treatment method

High Throughput Area Selective Spatial ALD with Interleaved Etching Steps for Low Defectivity

ALD and ALE: two biotopes of a kind in atomic-scale processing

Opening Remarks of Webinar on Materials Innovation Enabling Semiconductor Technologies

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11

Area-selective spatial ALD of SiO2 interleaved with back-etch corrections: Selectivity and surface inspection of non-growth area

Method and apparatus for depositing atomic layers on a substrate

Area selective atomic layer deposition method and tool

A method of manufacturing a semi-conducting thin film device

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

Method for removing a contamination layer by an atomic layer etching process

Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering