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Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)The present disclosure concerns an atomie layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...patent 2023
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Shen, J. (author), Roozeboom, F. (author), Mameli, A. (author)Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-spatial-ALD) of SiNx is demonstrated for the first time. Using bis(diethylamino)silane (BDEAS) and N2 plasma from a dielectric barrier discharge source, a process was developed at low deposition temperatures (≤ 250 °C). The effect of N2 plasma exposure time and overall...article 2023
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Karasulu, (author), Mameli, A. (author), Roozeboom, F. (author)A first-of-its-kind area-selective deposition process for SiO2 is developed consisting of film deposition with interleaved exposures to small molecule inhibitors (SMIs) and back-etch correction steps, within the same spatial atomic layer deposition (ALD) tool. The synergy of these aspects results in selective SiO2 deposition up to ˜23 nm with...article 2023
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Mameli, A. (author), Kronemeijer, A.J. (author), Roozeboom, F. (author)The present disclosure relates to a method of manufacturing a thin film device. A multilevel nanoimprint lithography template is transferred into a thin film stack comprising an electrode layer and a blanket sacrificial layer covering the electrode layer. The template is transferred, thereby patterning the device and exposing a predefined...patent 2023
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Mameli, A. (author), Shen, J. (author), Karasulu, B. (author), Roozeboom, F. (author)Area-selective atomic layer deposition (AS-ALD) holds great potential for advancing device manufacturing.(1) Recently, outstanding progress on this topic has been made in terms of understanding and developing highly selective processes for various material systems; some of these processes have already been transferred into fabs.(2) In this work...conference paper 2022
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- Jain, H. (author), Peper, J. (author), Nijboer, M.P. (author), Chen, M. (author), Aarnink, T. (author), Kovalgin, A.Y. (author), Roozeboom, F. (author), Nijmeijer, A. (author), Luiten-Olieman, M.W.J. (author) conference paper 2022
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- Peper, J. (author), Jain, H. (author), Nijboer, M.P. (author), Chen, M. (author), Aarnink, T. (author), Kovalgin, A.Y. (author), Roozeboom, F. (author), Nijmeijer, A. (author), Luiten-Olieman, M.W.J. (author) conference paper 2022
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- Shen, J. (author), Roozeboom, F. (author), Mameli, A. (author) conference paper 2022
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Creyghton, Y.L.M. (author), Poodt, P.W.G. (author), Simor, M. (author), Roozeboom, F. (author)A plasma source has an outer surface, interrupted by an aperture for delivering an atmospheric plasma from the outer surface. A transport mechanism transports a substrate in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface the and the substrate...patent 2022
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- Mameli, A. (author), Roozeboom, F. (author) public lecture 2021
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Roozeboom, F. (author)The IRDS 2017 Roadmap catches the scaling challenges faced by the semiconductor industry in the upcoming decades by the overall term "3D Power Scaling". In the past scaling era superior material properties and critical dimensions nearing single-digit nanometer values could still be realized by cost-effective technology solutions. As we approach...public lecture 2021
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- Roozeboom, F. (author) public lecture 2021
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- Roozeboom, F. (author) conference paper 2021
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- Mameli, A. (author), Karasulu, B. (author), Roozeboom, F. (author) public lecture 2021
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Knaapen, R.J.W. (author), Olieslagers, R. (author), van den Berg, D. (author), van den Boer, M.C. (author), Roozeboom, F. (author)Method of performing atomic layer deposition. The method comprises supplying a precursor gas towards a substrate, using a deposition head including one or more gas supplies, including a precursor gas supply. The precursor gas reacts near a surface of the substrate for forming an atomic layer. The deposition head has an output face comprising the...patent 2021
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Mameli, A. (author), Fawzy, A. (author), Roozeboom, F. (author), Poodt, P.W.G. (author)The present disclosure concerns an atomic layer deposition device for area-selective deposition of a target material layer onto a deposition area of a substrate surface further comprising a non-deposition area. In use the substrate is conveyed along a plurality of deposition and separator spaces including at least two gas separator spaces...patent 2021
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Mameli, A. (author), Kronemeijer, A.J. (author), Roozeboom, F. (author)The present disclosure relates to a method of manufacturing a thin film device (100). A multilevel nanoimprint lithography template (20) is transferred into a thin film stack comprising an electrode layer (11) and a blanket sacrificial layer (12) covering the electrode layer. The template is transferred, thereby patterning the device (100) and...patent 2021
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Mione, M.A. (author), Vandalon, V. (author), Mameli, A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2 plasma is reported along with an investigation of its underlying growth mechanism. Within the temperature range of 100−250 °C, the process demonstrates self-limiting growth with a growth per...article 2021
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Roozeboom, F. (author), Ehm, D.H. (author), Illiberi, A. (author), Becker, M. (author), te Sligte, E. (author), Creijghton, Y.L.M. (author)A method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation includes: performing an atomic layer etching process for at least partially removing the contamination layer (24) from the optical surface (14a), which, in tum, includes: exposing the...patent 2021
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- Mameli, A. (author), Brüner, P. (author), Roozeboom, F. (author), Grehl, T. (author), Poodt, P. (author) public lecture 2020