- Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage
- Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor
- Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering
- Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]
- On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity
- Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain high selectivity
- Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm
- Toward 3D Thin-Film Batteries: Optimal Current-Collector Design and Scalable Fabrication of TiO 2 Thin-Film Electrodes
- Area-selective atmospheric-pressure spatial ALD of SiO2 using interleaved back-etch steps yielding selectivity > 10 nm
- Large‐area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
- Large-area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
- Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se2 solar cells
- Stable and highly transparent Perovskite cell and module for high efficiency Perovskite/c Si 4-terminal tandems