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Molecular layer deposition of alucone in high aspect ratio trenches
Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage
Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor
Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor
Large-Area atmospheric pressure Spatial ALD for display applications
Large-Area atmospheric pressure Spatial ALD for display applications
About the importance of purge time in molecular layer deposition of alucone films
About the importance of purge time in molecular layer deposition of alucone films
Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering
Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering
Erratum
Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)]
On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity
On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity
Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain high selectivity
Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain high selectivity
Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm
Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm
Toward 3D Thin-Film Batteries: Optimal Current-Collector Design and Scalable Fabrication of TiO 2 Thin-Film Electrodes
Toward 3D Thin-Film Batteries: Optimal Current-Collector Design and Scalable Fabrication of TiO 2 Thin-Film Electrodes
Area-selective atmospheric-pressure spatial ALD of SiO2 using interleaved back-etch steps yielding selectivity > 10 nm
Area-selective atmospheric-pressure spatial ALD of SiO2 using interleaved back-etch steps yielding selectivity > 10 nm
Large‐area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
Large‐area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
Large-area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
Large-area spatial atomic layer deposition of amorphous oxide semiconductors at atmospheric pressure
Highly Efficient and Stable Rigid Perovskite/Si and Flexible Perovskite/CIGS 4-Terminal Tandems
Highly Efficient and Stable Rigid Perovskite/Si and Flexible Perovskite/CIGS 4-Terminal Tandems
Towards Large Area Stable Perovskite Solar Cells and Modules
Towards Large Area Stable Perovskite Solar Cells and Modules
Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se2 solar cells
Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se2 solar cells
Stable and highly transparent Perovskite cell and module for high efficiency Perovskite/c Si 4-terminal tandems
Stable and highly transparent Perovskite cell and module for high efficiency Perovskite/c Si 4-terminal tandems
Stable and highly transparent perovskite cells and modules for high efficiency perovskite/c-Si 4-thermal tandems
Stable and highly transparent perovskite cells and modules for high efficiency perovskite/c-Si 4-thermal tandems
High Temperature Thin-Film Barriers for Foldable AMOLED Displays
High Temperature Thin-Film Barriers for Foldable AMOLED Displays
Atmospheric Pressure Spatial ALD Layer for Ambient, Thermally and Light Stable p-i-n Planar Perovskite Solar Cells
Atmospheric Pressure Spatial ALD Layer for Ambient, Thermally and Light Stable p-i-n Planar Perovskite Solar Cells
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