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Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Deutz, A.F. (author), Molkenboer, F.T. (author), Muilwijk, P.M. (author), van der Walle, P. (author), Mulckhuyse, W.F.W. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author)Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under...conference paper 2017
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Hoogstrate, A.M. (author), Deutz, A.F. (author)TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis...conference paper 2016
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Pijnenburg, J.A.C.M. (author), te Voert, M.J.A. (author), de Vreugd, J. (author), Vosteen, L.L.A. (author), van Werkhoven, W.P. (author), Mekking, J. (author), Nijland, B.A.H. (author)Through the years many stable optical mounts have been designed, analyzed and tested at TNO. This paper gives an overview of the design principles used. Various examples are presented together with verification test results. The use of adhesives in combination with an iso-static mount design allows mounting of optical components in a limited...conference paper 2012
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Pijnenburg, J.A.C.M. (author), te Voert, M.J.A. (author), de Vreugd, J. (author), Vosteen, L.L.A. (author), van Werkhoven, W.P. (author), Mekking, J. (author), Nijland, B.A.H. (author)Through the years many stable optical mounts have been designed, analyzed and tested at TNO. This paper gives an overview of the design principles used. Various examples are presented together with verification test results. The use of adhesives in combination with an iso-static mount design allows mounting of optical components in a limited...public lecture 2012
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Rijnveld, N. (author), Henselmans, R. (author), Nijland, B.A.H. (author)One of the critical elements in the Four Laser Guide Star Facility (4LGSF) for the ESO Very Large Telescope (VLT) is the Optical Tube Assembly (OTA), consisting of a stable 20x laser beam expander and an active tip/tilt mirror, the Field Selector Mechanism (FSM). This paper describes the design and performance testing of the FSM. The driving...conference paper 2011