Searched for: author%3A%22Mulckhuyse%2C+W.F.W.%22
(1 - 16 of 16)
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Molkenboer, F.T. (author), Jansen, R. (author), van Werkhoven, W.P. (author), Luijkx, T.S. (author), Mulckhuyse, W.F.W. (author)
public lecture 2022
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Molkenboer, F.T. (author), Jansen, R. (author), Luijkx, T.S. (author), van Werkhoven, W.P. (author), Mulckhuyse, W.F.W. (author)
article 2022
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Molkenboer, F.T. (author), Jansen, R. (author), Luijkx, T.S. (author), van Werkhoven, W.P. (author), Mulckhuyse, W.F.W. (author)
public lecture 2022
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Molkenboer, F.T. (author), Jansen, R. (author), Luijkx, T.S. (author), Werkhoven, W.P. (author), Haasnoot, H.J. (author), Mulckhuyse, W.F.W. (author), van Schreven, E.L.C. (author), de Roode, B.J.M. (author)
public lecture 2021
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Molkenboer, F.T. (author), Jansen, R. (author), van Werkhoven, W.P. (author), Mulckhuyse, W.F.W. (author), van Schreven, E.L.C. (author), de Roode, B.J.M. (author), Haasnoot, H.J. (author), Abutan, A. (author), van der Valk, N.C.J. (author), Luijkx, T.S. (author)
public lecture 2021
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Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...
conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Deutz, A.F. (author), Molkenboer, F.T. (author), Muilwijk, P.M. (author), van der Walle, P. (author), Mulckhuyse, W.F.W. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author)
Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under...
conference paper 2017
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van der Walle, P. (author), Kramer, E. (author), van der Donck, J.C.J. (author), Mulckhuyse, W.F.W. (author), Nijsten, L. (author), Bernal Arango, F.A. (author), de Jong, A. (author), van Zeijl, E. (author), Spruit, W.E.T. (author), van den Berg, J.H. (author), Nanda, G. (author), van Langen-Suurling, A.K. (author), Alkemade, P.F.A. (author), Pereira, S.F. (author), Maas, D.J. (author)
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification...
conference paper 2017
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te Sligte, E. (author), van Putten, M. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Koster, N.B. (author), Westerhout, J. (author), Kerkhof, P.J. (author), Oostdijck, B.W. (author), Mulckhuyse, W.F.W. (author), Deutz, A.F. (author)
TNO has built EBL2; a facility for EUV exposure testing and surface analysis. EBL2 is capable of testing EUV optics, EUV photomasks, pellicles, and other components under controlled conditions, relevant to EUV scanner and source operation at all foreseen source power nodes. The system consists of an EUV beam line coupled to an X-ray...
conference paper 2017
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Hoogstrate, A.M. (author), Deutz, A.F. (author)
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis...
conference paper 2016
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Kalhor, N. (author), Mulckhuyse, W.F.W. (author), Alkemade, P.F.A. (author), Maas, D.J. (author)
This paper presents a heuristic model for scanning helium ion beam lithography (SHIBL) in a EUV chemically amplified resist. The model employs a point-spread function to account for all physical and chemical phenomena involved in the resist activation. Ion shot noise effects are accounted for using Poisson statistics. Our model shows a good...
conference paper 2015
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van der Walle, P. (author), Hannemann, S. (author), van Eijk, D. (author), Mulckhuyse, W.F.W. (author), van der Donck, J.C.J. (author)
public lecture 2014
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van der Walle, P. (author), Hannemann, S. (author), van Eijk, D. (author), Mulckhuyse, W.F.W. (author), van der Donck, J.C.J. (author)
The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner....
conference paper 2014
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Lahaye, D. (author), Mulckhuyse, W.F.W. (author)
Purpose - The purpose of this paper is to provide a framework for the implementation of an adjoint sensitivity formulation for least-squares partial differential equations constrained optimization problems exploiting a multiphysics finite elements package. The estimation of the diffusion coefficient in a Poisson-type diffusion equation is used...
article 2012
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Mulckhuyse, W.F.W. (author), Lahaye, D. (author), Belitskaya, A. (author)
In 3D reconstruction problems the number of design variables is large and the forward model is typically computationally expensive. Reconstruction using gradient-based optimization algorithms requires many gradient computations. For such problems the computational cost of a finite difference approach to gradient calculation is prohibitive since...
conference paper 2012
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Ploeg, J. (author), Mulckhuyse, W.F.W. (author), TNO Wegtransportmiddelen Technisch Physische Dienst TNO - TH (author)
The modern society's increasing mobility is placing a growing demand on traffic safety. An important way to meet this demand will be offered by on-board driver assistance systems. Introducing inter-vehicle communication allows these systems to use traffic data collected by other vehicles. This opens up the possibility to implement co-operative...
conference paper 2001
Searched for: author%3A%22Mulckhuyse%2C+W.F.W.%22
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