Demonstration of atomic force microscopy imaging using an integrated opto-electro-mechanical transducer

The low throughput of atomic force microscopy (AFM) is the main drawback in its large-scale deployment in industrial metrology. A promising solution would be based on the parallelization of the scanning probe system, allowing acquisition of the image by an array of probes operating simultaneously. A key step for reaching this goal relies on the...

Integrated optomechanical sensing for semiconductor metrology

In this talk we will present recent process on the integration of nano-opto-electro-mechanical sensors with photonic circuits and optical read-out, showing a route towards fully-integrated optical sensing.

Scattering contrast in GHz frequency ultrasound subsurface atomic force microscopy for detection of deeply buried features

While Atomic Force Microscopy is mostly used to investigate surface properties, people have almost since its invention sought to apply its high resolution capability to image also structures buried within samples. One of the earliest techniques for this was based on using ultrasound excitations to visualize local differences in effective tip...

High resolution acoustic metrology by combining high GHZ frequency ultrasound and scanning probe microscopy

In order to extract ever more performance from semiconductor devices on the same device area, the semiconductor industry is moving towards device structures with increasingly complex material combinations and 3D geometries. To ensure cost effective fabrication of next generation devices, metrology solutions are needed that tackle the specific...

Suitability of AFM cantilevers as wideband acoustic point receivers for the characterization of acoustic sources

In Subsurface Scanning Probe Microscopy (SSPM), Atomic Force Microscopy (AFM) is combined with ultrasound. The AFM cantilever is used as a receiver. At low frequencies (O(MHz)) the method can be used to measure the stiffness contrast in a sample and at high frequencies (O(GHz)) to measure scattering based contrast. Both variants use modulated...

High resolution acoustic metrology by combining high GHZ frequency ultrasound and scanning probe microscopy

In order to extract ever more performance from semiconductor devices on the same device area, the semiconductor industry is moving towards device structures with increasingly complex material combinations and 3D geometries. To ensure cost effective fabrication of next generation devices, metrology solutions are needed that tackle the specific...

On-chip waveguide-coupled opto-electro-mechanical system for nanoscale displacement sensing

Miniaturization of displacement sensors for nanoscale metrology is a key requirement in many applications such as accelerometry, mass sensing, and atomic force microscopy. While optics provides high resolution and bandwidth, integration of sensor readout is required to achieve low-cost, compact, and parallelizable devices. Here, we present a...

Optimization of acoustic coupling for bottom actuated scattering based subsurface scanning probe microscopy

The characterization of buried nanoscale structures nondestructively is an important challenge in a number of applications, such as defect detection and metrology in the semiconductor industry. A promising technique is Subsurface Scanning Probe Microscopy (SSPM), which combines ultrasound with Atomic Force Microscopy (AFM). Initially, SSPM was...

On-chip photocurrent displacement sensor based on a waveguide-coupled nanomechanical photonic crystal cavity

A nano-opto-electro-mechanical transducer for displacement sensing is presented. It consists of a double-membrane photonic crystal cavity integrated with electro-optical read-out and on-chip light-delivery. The operation is demonstrated by atomic force microscope actuation and photocurrent sensing.

Deep subsurface imaging with subsurface probe micro-scopy @ GHZ

This work details the initial simulation and experimental GHz SPM work carried out at TNO.

Development of a sample clamp for GHZ subsurface probe microscopy

Mapping buried nanostructures using subsurface ultrasonic resonance force microscopy

Nondestructive subsurface nanoimaging of buried nanostructures is considered to be extremely challeng- ing and is essential for the reliable manufacturing of nanotechnology products such as three-dimensional (3D) transistors, 3D NAND memory, and future quantum electronics. In scanning probe microscopy (SPM), a microcantilever with a sharp tip...

Sounding out buried nanostructures using subsurface ultrasonic resonance force microscopy

Imaging of nanoscale structures buried in a covering material is an extremely challenging task, but is also considered extremely important in a wide variety of fields. From fundamental research into the way living cells are built up to process control in semiconductor manufacturing would all benefit from the capability to image nanoscale...

Image-based overlay and alignment metrology through optically opaque media with sub-surface probe microscopy

Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are...

High-throughput scanning probe instruments for nanopatterning, alignment, and overlay metrology

As the pitch approaches the 10nm node, in order to meet current and future patterning challenges, high resolution techniques are required, complementary to extreme ultraviolet lithography (EUVL) for high volume manufacturing of nanodevices. These complementary techniques should have the following specifications: 1) High patterning resolution,...

Efficient and Stable Acoustical Coupling for GHz Subsurface Probe Microscopy

Many techniques are under development for the detection of subsurface defects or cracks. One such method is GHz subsurface probe microscopy (GHz SSPM). Here, modulated GHz elastic waves are transmitted through the bottom of a sample. The waves are scattered by buried features and detected using the probe of an atomic force microscope (AFM),...

Characterizing electron beam induced damage in metrology and inspection of advance devices