Searched for: author%3A%22Mertens%2C+B.M.%22
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Oderwald, M.P. (author), Ham, E.L. (author), van 't Hof, C.A. (author), Mertens, B.M. (author), van Mierlo, H.A. (author), Meiling, H. (author), Moors, R. (author), Meijer, H. (author), Blum, B. (author), TNO Industrie en Techniek (author)
conference paper 2006
Mertens, B.M. (author), Weiss, M. (author), Meiling, H. (author), Klein, R. (author), Louis, E. (author), Kurt, R. (author), Wedowski, M. (author), Trenkler, H. (author), Wolschrijn, B.T. (author), Jansen, R. (author), van de Runstraat, A. (author), Moors, R. (author), Spee, C.I.M.A. (author), Plöger, S. (author), van de Kruijs, R. (author), Technisch Physische Dienst TNO - TH (author)
Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss,...
article 2004
Mertens, B.M. (author), van der Zwan, B. (author), de Jager, P.W.H. (author), Leenders, M. (author), Werij, H.G.C. (author), Benschop, J.P.H. (author), van Dijsseldonk, A.J.J. (author), Technisch Physische Dienst TNO - TH (author)
Contamination of optics and mask is one of the possible show stoppers for Extreme Ultraviolet Lithography. One of the important sources of hydrocarbon contamination is the outgassing of photoresist coated wafers. Due to the vacuum conditions, these hydrocarbons can freely travel to coat the first optical component they encounter. This leads to...
article 2000