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Zoldesi, C.I. (author), Bal, K. (author), Blum, B. (author), Bock, G. (author), Brouns, D. (author), Dhalluin, F. (author), Dziomkina, N. (author), Arias Espinoza, J.D. (author), de Hoogh, J. (author), Houweling, S. (author), Jansen, M. (author), Kamali, M. (author), Kempa, A. (author), Kox, R. (author), de Kruif, R. (author), Lima, J. (author), Liu, Y. (author), Meijer, H. (author), Meiling, H. (author), van Mil, I. (author), Reijnen, M. (author), Scaccabarozzi, L. (author), Smith, D. (author), Verbrugge, B. (author), de Winter, L. (author), Xiong, X. (author), Zimmerman, J. (author)As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume...conference paper 2014
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- Oderwald, M.P. (author), Ham, E.L. (author), van 't Hof, C.A. (author), Mertens, B.M. (author), van Mierlo, H.A. (author), Meiling, H. (author), Moors, R. (author), Meijer, H. (author), Blum, B. (author), TNO Industrie en Techniek (author) conference paper 2006
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Mertens, B.M. (author), Weiss, M. (author), Meiling, H. (author), Klein, R. (author), Louis, E. (author), Kurt, R. (author), Wedowski, M. (author), Trenkler, H. (author), Wolschrijn, B.T. (author), Jansen, R. (author), van de Runstraat, A. (author), Moors, R. (author), Spee, C.I.M.A. (author), Plöger, S. (author), van de Kruijs, R. (author), Technisch Physische Dienst TNO - TH (author)Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss,...article 2004
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Technisch Physische Dienst TNO - TH (author), Meiling, H. (author), Banine, V. (author), Kürz, P. (author), Blum, B. (author), Heerens, G.J. (author), Harned, N. (author)With the realisation of the alpha-tool, ASML is progressing with the pre-commercialisation phase of its EUVL development. We report on the progress in the development of several key modules of the alpha-tool, including the source, wafer stage and reticle stage, wafer handling, baseframe, and optics modules. We demonstrate that the focus sensor...conference paper 2003