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Parsons, G.N. (author), Elam, J.W. (author), George, S.M. (author), Haukka, S. (author), Jeon, H. (author), Kessels, W.M.M. (author), Leskelä, M. (author), Poodt, P. (author), Ritala, M. (author), Rossnagel, S.M. (author)
article 2020
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Ahvenniemi, E. (author), Akbashev, A.R. (author), Ali, S. (author), Bechelany, M. (author), Berdova, M. (author), Boyadjiev, S. (author), Cameron, D.C. (author), Chen, R. (author), Chubarov, M. (author), Cremers, V. (author), Devi, A. (author), Drozd, V. (author), Elnikova, L. (author), Gottardi, G. (author), Grigoras, K. (author), Hausmann, D.M. (author), Seong Hwang, C. (author), Jen, S.H. (author), Kallio, T. (author), Kanervo, J. (author), Khmelnitskiy, I. (author), Kim, D.H. (author), Klibanov, L. (author), Koshtyal, Y. (author), Krause, A.O.I. (author), Kuhs, J. (author), Kärkkänen, I. (author), Kääriäinen, M.L. (author), Kääriäinen, T. (author), Lamagna, L. (author), Łapicki, A.A. (author), Leskelä, M. (author), Lipsanen, H. (author), Lyytinen, J. (author), Malkov, A. (author), Malygin, A. (author), Mennad, A. (author), Militzer, C. (author), Molarius, J. (author), Norek, M. (author), Özgit-Akgün, Ç. (author), Panov, M. (author), Pedersen, H. (author), Piallat, F. (author), Popov, G. (author), Puurunen, R.L. (author), Rampelberg, G. (author), Ras, R.H.A. (author), Rauwel, E. (author), Roozeboom, F. (author), Sajavaara, T. (author), Salami, H. (author), Savin, H. (author), Schneider, N. (author), Seidel, T.E. (author), Sundqvist, J. (author), Suyatin, D.B. (author), Törndahl, T. (author), van Ommen, J.R. (author), Wiemer, C. (author), Ylivaara, O.M.E. (author), Yurkevich, O. (author)
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...
article 2017
document
Parsons, G.N. (author), Elam, J.W. (author), George, S.M. (author), Haukka, S. (author), Jeon, H. (author), Kessels, W.M.M. (author), Leskelä, M. (author), Poodt, P. (author), Ritala, M. (author), Rossnagel, S.M. (author)
This article explores the history of atomic layer deposition (ALD) and its relationship with the American Vacuum Society (AVS). The authors describe the origin and history of ALD science in the 1960s and 1970s. They also report on how the science and technology of ALD progressed through the 1990s and 2000s and continues today. This article...
article 2013