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Houben, M.M.J. (author), Kurt, R. (author), Khalid, H. (author), Zoet, P. (author), Bos, J.E. (author), Turan, O. (author)
Within the EU FP7 project SILENV, noise and vibration measurements were carried out on several ships. These objective measures were accompanied by subjective measures recorded through questionnaires. With this, we developed models describing the relationship between the levels of noise and vibration on board ships and subjective ratings on...
conference paper 2012
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Mertens, B.M. (author), Weiss, M. (author), Meiling, H. (author), Klein, R. (author), Louis, E. (author), Kurt, R. (author), Wedowski, M. (author), Trenkler, H. (author), Wolschrijn, B.T. (author), Jansen, R. (author), van de Runstraat, A. (author), Moors, R. (author), Spee, C.I.M.A. (author), Plöger, S. (author), van de Kruijs, R. (author), Technisch Physische Dienst TNO - TH (author)
Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss,...
article 2004