Searched for: author%3A%22Koster%2C+N.B.%22
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Bekman, H.H.P.T. (author), Westland, Y. (author), Elstgeest, T.H. (author), Mechielsen, T.W. (author), Haye, M.J. (author), Emmelkamp, J. (author), Molkenboer, F.T. (author), Koster, N.B. (author), Lensen, H.A. (author)
MFIG is a metrology tool for detecting low levels of contamination (Volatile Organic Compounds (VOC) and Airborne Molecular Contamination (AMC)). MFIG consist of an ion source followed by an electrostatic lens for beam focus control. After the electrostatic lens mass separation is achieved with a static magnet field. Detection is done by a...
public lecture 2022
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Stortelder, J.K. (author), Ebeling, R.P. (author), Rijnsent, C.G.J. (author), van Putten, M. (author), Rooij-Lohmann, V.I.T.A. (author), Smit, M.E.M. (author), Storm, A.J. (author), Koster, N.B. (author), Lensen, H.A. (author), Philipsen, V. (author), Opsomer, K. (author), Thakare, D. (author), Feigl, T. (author), Naujok, P. (author)
Novel reticle absorber materials are required for high-NA EUV lithography. TNO and ASML developed an assessment for the compatibility of novel high-NA reticle absorber materials with conditions that mimic the EUV scanner environment[1]. Four candidate reticle absorber materials were evaluated, TaCo, RuTa, PtMo and Pt2Mo alloys, in a joint...
conference paper 2021
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Ushakov, A. (author), Velthuis, J.F.M. (author), Koster, N.B. (author), Janssen, J.P.B. (author)
The new generation compact X-ray source for semiconductor metrology requires a brilliance that is higher than existing technology can offer. In this report, we propose a new X-ray source where an electron beam is focused on a rotating liquid metal anode. We assume that high brilliance emission can be achieved with power densities up to 10 MW/mm2...
conference paper 2020
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van der Walle, P. (author), Stortelder, J.K. (author), Wu, C.C. (author), Lensen, H.A. (author), Koster, N.B. (author)
The EUV BeamLine 2 (EBL2) is being used to expose samples to EUV radiation for optics and mask lifetime testing. Before and after exposure the samples can be analyzed in-situ by X-ray photoelectron spectroscopy (XPS). During exposure the samples can be monitored in real-time by an imaging ellipsometer. We report on the development of two...
conference paper 2020
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Emmelkamp, J. (author), Molkenboer, F.T. (author), Bekman, H.H.P.T. (author), van den Brink, J. (author), Wismeijer, D.A. (author), Koster, N.B. (author), Maas, D.J. (author), Kievit, O. (author), Lensen, H.A. (author)
Residual Gas Analyzers (RGA) are often used to measure background gases and contaminations in vacuum systems. An ionizer is used to ionize gas molecules and these ions are accelerated and focused by an electrical field from the ion source to form an ion beam. The ions can be discriminated based on mass/charge ratio by a magnetic field, and the...
conference paper 2020
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Ushakov, A. (author), Verlaan, A.L. (author), Ebeling, R.P. (author), Wu, C.C. (author), O'Neill, R. (author), Smith, M. (author), Stratton, B. (author), Koster, N.B. (author), Gattuso, A. (author), Lasnier, C.J. (author), Feder, R. (author), Maniscalco, M.P. (author), Verhoeff, P. (author)
One of the important aspects of the service life of the first and second optical mirrors (FM and SM) in ITER UWAVS diagnostics is to understand the influence of plasma cleaning on materials re-deposition and optical surface quality after multiple cleaning cycles. The capacitively coupled RF 30-60 MHz system is a candidate for the UWAVS mirror...
article 2019
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Bekman, H.H.P.T. (author), Dekker, M.F. (author), Ebeling, R.P. (author), Janssen, J.P.B. (author), Koster, N.B. (author), Meijlink, J.R. (author), Molkenboer, F.T. (author), Nicolai, K. (author), van Putten, M. (author), Rijnsent, C.G.J. (author), Storm, A.J. (author), Stortelder, J.K. (author), Wu, C.C. (author), de Zanger, R.M.S. (author)
Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and installed at TNO, in close cooperation with Carl Zeiss. There was a desire to improve on the performance...
conference paper 2019
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Molkenboer, F.T. (author), Jansen, R. (author), Veraar, R.G. (author), Otter, G.C.J. (author), van Werkhoven, W.P. (author), Koster, N.B. (author), Driessen, F.P.G. (author)
public lecture 2018
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Ushakov, A. (author), Verlaan, A.L. (author), Ebeling, R.P. (author), Rijfers, A. (author), O'Neill, R. (author), Smith, M. (author), Stratton, B. (author), Koster, N.B. (author), van der List, J.F.M. (author), Gattuso, A. (author), Lasnier, C.J. (author), Feder, R. (author), Maniscalco, M.P. (author), Verhoeff, P. (author)
In ITER, first mirrors for the Upper Wide Angle Viewing System (UWAVS) are expected to experience contamination with beryllium and tungsten. Contamination levels of 10 nm can degrade mirror performance. In the UWAVS, a first mirror cleaning system will use radio-frequency (RF) gas discharge. A mockup in representative geometry was developed. The...
article 2018
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Ushakov, A. (author), Verlaan, A.L. (author), Ebeling, R.P. (author), Rijfers, A. (author), O'Neill, R. (author), Smith, M. (author), Stratton, B. (author), Koster, N.B. (author), van der List, J.F.M. (author), Gattuso, A. (author), Lasnier, C.J. (author), Feder, R. (author), Maniscalco, M.P. (author), Verhoeff, P. (author)
First metallic mirrors used in optical diagnostics such as the Upper Wide Angle Viewing System (UWAVS) in ITER may undergo contamination with beryllium and tungsten. Contamination levels of 10 nm can significantly degrade mirror performance. A UWAVS first mirror cleaning system prototype uses radio-frequency (RF) gas discharge to remove...
article 2018
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Roozeboom, F. (author), Lankhorst, A.M. (author), Poodt, P.W.G. (author), Koster, N.B. (author), Winands, G.J.J. (author), Vermeer, A.J.P.M. (author)
The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the...
patent 2017
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Verberk, R. (author), Koster, N.B. (author), te Sligte, E. (author), Staring, W.P.M. (author)
conference paper 2017
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Maas, D.J. (author), Muilwijk, P.M. (author), van Putten, M. (author), de Graaf, F. (author), Kievit, O. (author), Boerboom, P.B.T.H. (author), Koster, N.B. (author)
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass...
other 2017
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Koster, N.B. (author), te Sligte, E. (author), Molkenboer, F.T. (author), Deutz, A.F. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Westerhout, J. (author)
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling infrastructure. Recently we finished installation of the source, exposure chamber, handlers and XPS...
conference paper 2017
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Koster, N.B. (author), te Sligte, E. (author), Deutz, A.F. (author), Molkenboer, F.T. (author), Muilwijk, P.M. (author), van der Walle, P. (author), Mulckhuyse, W.F.W. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author)
Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under...
conference paper 2017
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Maas, D.J. (author), Muilwijk, P.M. (author), van Putten, M. (author), de Graaf, F. (author), Kievit, O. (author), Boerboom, P.B.T.H. (author), Koster, N.B. (author)
To produce high-end products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. Here is where MFIG can help1. The massfiltered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass...
conference paper 2017
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te Sligte, E. (author), van Putten, M. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Koster, N.B. (author), Westerhout, J. (author), Kerkhof, P.J. (author), Oostdijck, B.W. (author), Mulckhuyse, W.F.W. (author), Deutz, A.F. (author)
TNO has built EBL2; a facility for EUV exposure testing and surface analysis. EBL2 is capable of testing EUV optics, EUV photomasks, pellicles, and other components under controlled conditions, relevant to EUV scanner and source operation at all foreseen source power nodes. The system consists of an EUV beam line coupled to an X-ray...
conference paper 2017
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van Veldhoven, J. (author), Huijser, T. (author), Nieuwkoop, E. (author), van Putten, M. (author), Koster, N.B. (author), Maas, D.J. (author)
A reproducible measurement of in-band EUV power over time is essential in EUV lithography, e.g. for dose control, for monitoring the transmission of (parts of) the optical path and for detecting changes in EUV source performance. However, all currently available sensors suffer from sensitivity degradation over time due to photon-induced...
conference paper 2016
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van Veldhoven, J. (author), Huijser, T. (author), Nieuwkoop, E. (author), van Putten, M. (author), Koster, N.B. (author), Maas, D.J. (author)
A reproducible measurement of in-band EUV power over time is essential in EUV lithography, e.g. for dose control, monitoring the transmission of (parts of) the optical path and detecting changes in EUV source performance. However, all currently available sensors suffer from sensitivity degradation over time due to photon-induced contamination...
public lecture 2016
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te Sligte, E. (author), Koster, N.B. (author), Molkenboer, F.T. (author), van der Walle, P. (author), Muilwijk, P.M. (author), Mulckhuyse, W.F.W. (author), Oostdijck, B.W. (author), Hollemans, C.L. (author), Nijland, B.A.H. (author), Kerkhof, P.J. (author), van Putten, M. (author), Hoogstrate, A.M. (author), Deutz, A.F. (author)
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and testing of EUV optics and components by providing a publicly accessible exposure and analysis...
conference paper 2016
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