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Phung, N. (author), van Helvoirt, C. (author), Beyer, W. (author), Anker, J. (author), Naber, R.C.G. (author), Renes, M. (author), Kessels, W.M.M. (author), Geerligs, L.J. (author), Creatore, M. (author), Macco, B. (author)In recent years, passivating contacts based on SiO2/poly-Si have proven to be an enabling technology for Si solar cells. Effective hydrogenation of the interfacial SiO2 is vital for realizing efficient contacts. Hydrogen-rich dielectrics, such as SiNx and Al2O3, are commonly employed for hydrogenation, whereas also recently, n-type conductive...article 2022
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Merkx, M.J.M. (author), Angelidis, A. (author), Mameli, A. (author), Li, J. (author), Lemaire, P.C. (author), Sharma, K. (author), Hausmann, D.M. (author), Kessels, W.M.M. (author), Sandoval, T.E. (author), Mackus, A.J.M. (author)Implementation of vapor/phase dosing of small molecule inhibitors (SMIs) in advanced atomic layer deposition (ALD) cycles is currently being considered for bottom-up fabrication by area-selective ALD. When SMIs are used, it can be challenging to completely block precursor adsorption due to the inhibitor size and the relatively short vapor/phase...article 2022
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Merkx, M.J.M. (author), Jongen, R.G.J. (author), Mameli, A. (author), Lemaire, P.C. (author), Sharma, K. (author), Hausmann, D.M. (author), Kessels, W.M.M. (author), Mackus, A.J.M. (author)As the semiconductor industry progresses toward more complex multilayered devices with ever smaller features, accurately aligning these layers with respect to each other has become a bottleneck in the advancement to smaller transistor nodes. To avoid alignment issues, area-selective atomic layer deposition (ALD) can be employed to deposit...article 2021
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- Melskens, J. (author), Theeuwes, R.J. (author), Black, L.E. (author), Berghuis, W.J.H. (author), Macco, B. (author), Bronsveld, P.C.P. (author), Kessels, W.M.M. (author) article 2021
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Mione, M.A. (author), Vandalon, V. (author), Mameli, A. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2 plasma is reported along with an investigation of its underlying growth mechanism. Within the temperature range of 100−250 °C, the process demonstrates self-limiting growth with a growth per...article 2021
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- Parsons, G.N. (author), Elam, J.W. (author), George, S.M. (author), Haukka, S. (author), Jeon, H. (author), Kessels, W.M.M. (author), Leskelä, M. (author), Poodt, P. (author), Ritala, M. (author), Rossnagel, S.M. (author) article 2020
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Karwal, S. (author), Verheijen, M.A. (author), Arts, K. (author), Faraz, T. (author), Kessels, W.M.M. (author), Creatore, M. (author)In this work, we report on the atomic layer deposition (ALD) of HfNx thin films by employing CpHf(NMe2)3 as the Hf(IV) precursor and Ar–H2 plasma in combination with external RF substrate biasing as the co-reactant. Following up on our previous results based on an H2 plasma and external RF substrate biasing, here we address the effect of ions...article 2020
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- Sharma, K. (author), Williams, B.L. (author), Mittal, A. (author), Knoops, H.C.M. (author), Kniknie, B.J. (author), Bakker, N.J. (author), Kessels, W.M.M. (author), Schropp, R.E.I. (author), Creatore, M. (author) article 2020
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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- Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) conference paper 2019
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- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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Faraz, T. (author), Arts, K. (author), Karwal, S. (author), Knoops, H.C.M. (author), Kessels, W.M.M. (author)Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in the synthesis of nanoscale films with precise growth control. Apart from the well-established contribution of highly reactive neutral radicals towards film growth in PEALD, the ions generated by the plasma can also play a significant role. In this work, we...article 2019
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- Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2019
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Mione, M.A. (author), Engeln, R. (author), Vandalon, V. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures for large area applications. The spatial separation of the ALD half-reactions and the use of an atmospheric pressure plasma as the reactant give rise to complex surface chemistry which is...article 2019
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Mameli, A. (author), Karsulu, B. (author), Verheijen, M.A. (author), Barcones, B. (author), Macco, B. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Area-selective atomic layer deposition (ALD) of ZnO was achieved on SiO2 seed layer patterns on Hterminated silicon substrates, using diethylzinc (DEZ) as the zinc precursor and H2O as the coreactant. The selectivity of the ALD process was studied using in situ spectroscopic ellipsometry and scanning electron microscopy, revealing improved...article 2019
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Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author)Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles...article 2018
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- Mione, M.A. (author), Creyghton, Y. (author), Engeln, R. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) conference paper 2018
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- Mameli, A. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
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- Mameli, A. (author), Karasulu, B. (author), Verheijen, M.A. (author), Mackus, A.J.M. (author), Kessels, W.M.M. (author), Roozeboom, F. (author) public lecture 2018
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Zardetto, V. (author), di Giacomo, F. (author), Lifka, H. (author), Verheijen, M.A. (author), Weijtens, C.H.L. (author), Black, L.E. (author), Veenstra, S. (author), Kessels, W.M.M. (author), Andriessen, R. (author), Creatore, M. (author)Perovskite solar cells (PSCs) are emerging among the photovoltaic (PV) technologies due to their high power conversion efficiency (PCE) in combination with potentially low cost manufacturing processing. In this contribution, the fabrication of efficient planar n-i-p PSCs by the modification of the electron transport layer (ETL) adopted as n-type...article 2018