Spatial Atomic Layer Deposition for large area and flexible electronics

Next-gen batteries: enabled by spatial atomic layer interfacing

Li-ion batteries have emerged as the key energy storage technology, not only in portable electronics & gadgets but also in electric vehicles (EV) and grid-storage. A combination of high energy density anodes such as silicon or lithium, and Ni- or Li-rich cathode1,2 is necessary to achieve the targeted energy density of >350 Wh/Kg. The challenge...

Large-Area Atmospheric-Pressure Spatial ALD enabling All-Solid-State 3D Batteries with Ultrathin LiPON and High-Capacity Electrodes

Large-area spatial atmospheric ALD: Al2O3 in a Gen-1 sheet-to-sheet prototype tool

High-throughput processes for industrially scalable deposition of zinc oxide at atmospheric pressure

ZnO films have been grown on a moving glass substrate by high temperature (480 0C) chemical vapour deposition (CVD) and low temperature (200 0C) plasma enhanced CVD (PE-CVD) process at atmospheric pressure. Deposition rates above 7 nm/s have been achieved for substrate speeds from 20 to 500 mm/min. The conductivity of the films is enhanced by Al...

High rate (∼7 nm/s), atmospheric pressure deposition of ZnO front electrode for Cu(In,Ga)Se2 thin-film solar cells with efficiency beyond 15%

Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma-enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ∼7 nm/s are achieved at low temperature (200°C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in the visible range (90%). By a short (∼minute)...

Development of atmospheric pressure CVD processes for highquality transparent conductive oxides

For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is shown that by combining precursor development, fundamental gas phase and surface chemistry studies,...

Development of APCVD process for high quality TCO

For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is...