Searched for: author%3A%22George%2C+S.M.%22
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Parsons, G.N. (author), Elam, J.W. (author), George, S.M. (author), Haukka, S. (author), Jeon, H. (author), Kessels, W.M.M. (author), Leskelä, M. (author), Poodt, P. (author), Ritala, M. (author), Rossnagel, S.M. (author)
article 2020
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Parsons, G.N. (author), Elam, J.W. (author), George, S.M. (author), Haukka, S. (author), Jeon, H. (author), Kessels, W.M.M. (author), Leskelä, M. (author), Poodt, P. (author), Ritala, M. (author), Rossnagel, S.M. (author)
This article explores the history of atomic layer deposition (ALD) and its relationship with the American Vacuum Society (AVS). The authors describe the origin and history of ALD science in the 1960s and 1970s. They also report on how the science and technology of ALD progressed through the 1990s and 2000s and continues today. This article...
article 2013
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Poodt, P.W.G. (author), Cameron, D.C. (author), Dickey, E. (author), George, S.M. (author), Kuznetsov, V. (author), Parsons, G.N. (author), Roozeboom, F. (author), Sundaram, G. (author), Vermeer, A. (author)
Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing. An approach to overcome this drawback is spatial ALD, i.e., an ALD mode...
article 2012