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Saathof, R. (author), Meskers, A.J.H. (author), van Kempen, F.C.M. (author), Witvoet, G. (author), Korevaar, C.W. (author), de Lange, T.J. (author), Crowcombe, E.E. (author), Fritz, E.C. (author), van de Pol, M. (author)Optical satellite communications is a maturing technology to enable word-wide access to high throughput internet. In the past years a lot of effort has been taken to increase the applicability and the TRL of this technology. In collaboration with industry, TNO initiated several developments for space and ground technologies. Many of these...conference paper 2021
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Saathof, R. (author), Kuiper, S. (author), Crowcombe, W.E. (author), de Man, H. (author), de Lange, T.J. (author), van der Valk, N.C.J. (author), Kramer, L. (author), Fritz, E.C. (author)Optical communications will complement radio frequency (RF) communications in the coming decades to enhance throughput, power efficiency and link security of satellite communication links. To enable optical communications technology for intersatellite links and (bi-directional) ground to satellite links, TNO develops a suite of technologies in...conference paper 2019
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Ringers, M. (author), Fritz, E.C. (author), Crowcombe, W.E. (author), de Man, H. (author), de Lange, T.J. (author), Hazelebach, R.L.M. (author), Meskers, A.J.H. (author), Otten, M.P.G. (author), Leemhuis, A.P. (author), Bell, D.A. (author)HAPS, a station located on an object at an altitude of 20 to 50 km and at a specified, nominal, fixed point relative to the Earth (ITU RR Vol I 1.66a). A HAPS can be a unmanned airplane, a balloon, or an airship. All require electrical power to keep themselves and their payload functional. Since HAPS operate at much lower altitudes than...other 2019
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Fritz, E.C. (author), van der Valk, N.C.J. (author), Witvoet, G. (author), Bos, A. (author), de Man, H. (author), Crowcombe, W.E. (author), van der Heijden, N. (author), Kerkhof, P.J. (author)Cube satellite (cubesat) is a specific realization of a smallsat that is characterized by its volume changing in increments of 1dm3, or 1U. A (popular) 3U format cubesat is furthermore classified as a Nano satellite, as it typically has a mass between 1 and 10 kg. Within CubeSATs expanding the downlink data bandwidth is one of the central...other 2019
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Pettazzi, F. (author), de Bruijn, D. (author), Gruber, J.M. (author), van den Engel, P. (author), Dekker, B. (author), Moens, T.M.N. (author), Fritz, E.C. (author)To support the development program on Optical Communication (OC), a dedicated facility for testing is being realized. Such a facility will be used for technology development and to perform end to end communication tests. The facility aims to enable the following three high level functionalities: testing of critical technologies and subsystems in...other 2019
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Dresscher, M. (author), Human, J.D. (author), Witvoet, G. (author), van der Heiden, N. (author), den Breeje, R. (author), Kuiper, S. (author), Fritz, E.C. (author), Korevaar, C.W. (author), van der Valk, N.C.J. (author), de Lange, T.J. (author), Saathof, R. (author), Doelman, N.J. (author), Crowcombe, W.E. (author), Duque, C.M. (author), de Man, H. (author)The anticipated capacity benefit of optical satellite communications has triggered a cascade of technology developments. In this paper, we present three such technologies, namely; i). A cube satellite laser terminal (CubeCAT), ii). A lower Earth orbit satellite optical head (LEOCAT) and iii). A calibration and verification test bench for coarse...conference paper 2019
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Bussink, P.G.W. (author), Volatier, J.B. (author), van der Walle, P. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author)The Rapid Nano is a particle inspection system developed by TNO for the qualification of EUV reticle handling equipment. The detection principle of this system is dark-field microscopy. The performance of the system has been improved via model-based design. Through our model of the scattering process we identified two key components to improving...conference paper 2016
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van der Donck, J.C.J. (author), Bussink, P.G.W. (author), Fritz, E.C. (author), van der Walle, P. (author)Cleanliness is a prerequisite for obtaining economically feasible yield levels in the semiconductor industry. For the next generation of lithographic equipment, EUV lithography, the size of yield-loss inducing particles for the masks will be smaller than 20 nm. Consequently, equipment for handling EUV masks should not add particles larger than...article 2016
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Kuiper, S. (author), Fritz, E.C. (author), Crowcombe, W.E. (author), Liebig, T. (author), Kramer, G.F.I. (author), Witvoet, G. (author), Duivenvoorde, T. (author), Overtoom, A.J. (author), Rijnbeek, R.A. (author), van Zwet, E.J. (author), van Dijsseldonk, A. (author), den Boef, A. (author), Beems, M. (author), Levasier, L. (author)Nowadays most overlay metrology tools assess the overlay performance based on marker features which are deposited next to the functional device features within each layer of the semiconductor device. However, correct overlay of the relatively coarse marker features does not directly guarantee correct overlay of the much smaller device features....conference paper 2016
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Nijenhuis, J.R. (author), Heijmans, J.A.C. (author), de Breeje, R. (author), Hazelebach, R.L.M. (author), de Vreugd, J. (author), Crowcombe, W.E. (author), Naron, D.J. (author), Fritz, E.C. (author), Borghi, G. (author), Navarro, R. (author), Sillari, L. (author), Sambenedetto, E. (author), Eder, J. (author), Kamphues, F.G. (author)Described is the M1 segment support, as designed by TNO in the period 2015- 2016. The design has significantly changed and improved compared to the earlier designs. During the period 2009-2010 prototypes for the primary mirror support of the E-ELT have been developed. These have been extensively tested by ESO. Design improvement were found to be...conference paper 2016
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- Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author) other 2014
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Crowcombe, W.E. (author), Hollemans, C.L. (author), Fritz, E.C. (author), van der Donck, J.C.J. (author), Koster, N.B. (author)Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was...conference paper 2014
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Doelman, N.J. (author), van den Braber, R. (author), Kasparek, W. (author), Erckmann, V. (author), Bongers, W. (author), Krijger, B. (author), Stober, J. (author), Fritz, E.C. (author), Dekker, A. (author), Klop, W.A. (author), Hollmann, F. (author), Michel, G. (author), Noke, F. (author), Purps, F. (author), de Baar, M. (author), Maraschek, M. (author), Monaco, F. (author), Müller, S. (author), Schütz, H. (author), Wagner, D. (author)High-power resonant diplexers for millimetre waves have various promising applications in ECRH systems. The round-trip resonator length of a diplexer needs to be accurately tuned to match its prescribed functionality. For this purpose one of the mirrors in the FADIS MkIIa diplexer has been mounted on a motion system, in order to control the...conference paper 2012