Title
Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning
Author
van Veldhoven, J.
Stodólna, A.S.
Storm, A.J.
van den Brink, J.
Geerits, N.
Vlaar, J.
Dekker, M.F.
Ushakov, A.
Publication year
2021
Subject
Electron beams
Gas discharge devices
Low-temperature plamas
Nuclear and plasma sciences
Plasma applications
Plasma devices
Plasma materials processing
Plasma properties
Plasmas
High Tech Systems & Materials
Industrial Innovation
To reference this document use:
http://resolver.tudelft.nl/uuid:8aa42493-de5b-47ae-8758-c4df5b5ebbcf
TNO identifier
959536
Publisher
IEEE
Source
IEEE transactions on plasma science, 49 (49), 3132-3141
Document type
article