Print Email Facebook Twitter Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm Title Area-selective deposition of SiO2 based on spatial ALD with interleaved etching steps to obtain selectivities > 10 nm Author Mameli, A. Roozeboom, F. Poodt, P. Publication year 2019 Subject Industrial InnovationAtomic layer etchingALESiO2Atomic layer depositionSpatial ALDEtching To reference this document use: http://resolver.tudelft.nl/uuid:e4606eb1-ef82-42c0-8802-51043013d6a7 TNO identifier 868222 Bibliographical note 4th Area Selective Deposition Workshop, Leuven, Belgium, 4-5 April, 2019 Document type public lecture Files To receive the publication files, please send an e-mail request to TNO Library.