Title
Spatial atmospheric ALD of functional layers for CIGS Solar Cells
Author
Illiberi, A.
Frijters, C.
Balder, J.E.
Poodt, P.W.G.
Roozeboom, F.
Publication year
2015
Abstract
Spatial Atmosperic Atomic Layer Depositon combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rages (up tot nm/s). In this paper we present a short overview of our research acctivity carried out on S-ALD of functional thin filsm for the front window of copper indium gallium di-selenide (CIGS) solar cells. Zn(O,S) and ZnO:Al are grown by co-injecting the vaporized precursors of the cationic (O,S) and anionic (Zn, Al) elements, respectively. An insight on the growth characteristics and properties of Zn(O,S)and ZnO;Al is presented
Subject
Nano Technology
TFT - Thin Film Technology
TS - Technical Sciences
Materials
Industrial Innovation
Atmospheric pressure
Atomic layer deposition
To reference this document use:
http://resolver.tudelft.nl/uuid:e1d02719-2838-4fb4-991e-df2c12199cd5
DOI
https://doi.org/10.1149/06907.0031ecst
TNO identifier
528482
Publisher
Electrochemical Society
Source
ECS Transactions, 69 (7), 31-37
Document type
article