Title
TNO reticle handling test platform
Author
Crowcombe, W.E.
Hollemans, C.L.
Fritz, E.C.
van der Donck, J.C.J.
Koster, N.B.
Publication year
2014
Abstract
Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was built based on a modular concept with three uniform linked base frames. In the first stage of the project a dual pod loading unit, two exchange units for opening inner pods and a reticle flip unit are installed on the base frames. In the near future improvements on cleanliness will be tested and particle detection equipment will be integrated. The system will act as a testing platform for clean handling technology for industry. © 2014 SPIE.
Subject
TS - Technical Sciences
Physics & Electronics
Industrial Innovation
High Tech Systems & Materials
EUV
Ultra-clean
Molecular physics
Modular concepts
Particle detection
Reticle handling
Testing platforms
Optical instruments
NI - Nano Instrumentation
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TNO identifier
507149
Publisher
SPIE
ISBN
9780819499714
ISSN
1996-756X
Source
Extreme Ultraviolet (EUV) Lithography V, 24-27 February 2014, San Jose, CA, USA, 9048 (9048)
Series
Proceedings of SPIE - The International Society for Optical Engineering
Document type
conference paper