Title
Area-Selective Spatial ALD of SiO2Interleaved with Etch-Back Supercycles: Quantification of Area Selectivity by Low Energy Ion Scattering
Author
Mameli, A.
Brüner, P.
Roozeboom, F.
Grehl, T.
Poodt, P.
Publication year
2020
Subject
Industrial Innovation
Atomic layer etching
ALE
SiO2
Atomic layer deposition
Spatial ALD
Etching
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http://resolver.tudelft.nl/uuid:d2fdbe7d-ff88-436a-886d-0f1f43b84774
TNO identifier
881950
Article number
#D01-1382
Bibliographical note
Digital PRiME 2020 Meeting, 238th Electrochemical Society Meeting, Honolulu, Virtual, Oct. 4-9, 2020. (Invited)
Document type
public lecture