Print Email Facebook Twitter Area-selective spatial ALD of SiO2 interleaved with back-etch corrections Title Area-selective spatial ALD of SiO2 interleaved with back-etch corrections: Selectivity and surface inspection of non-growth area Author Mameli, A. Karasulu, B. Roozeboom, F. Publication year 2021 Subject Area selective spatial ALDAtomic layer deposition To reference this document use: http://resolver.tudelft.nl/uuid:d0e6c388-25f2-471d-8e41-220179ce6a1a TNO identifier 956232 Publisher The Electrochemical Society (ECS) Source ECS Transactions, 102 (102) Bibliographical note 239th ECS Symposium, Chicago, May 30 – June 3, 2021,Virtual Meeting (Invited) Document type public lecture Files To receive the publication files, please send an e-mail request to TNO Library.