Print Email Facebook Twitter On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity Title On the role of individual etching components in selective atomic layer processing: Etch and deposit to afford high selectivity Author Mameli, A. Roozeboom, F. Poodt, P. Publication year 2019 Subject Industrial InnovationAtomic layer etchingALEZnOAtomic layer depositionALDPlasma etchingZinc oxide To reference this document use: http://resolver.tudelft.nl/uuid:d0cf20e6-bf4a-4bcf-8694-97de19a824fb TNO identifier 868174 Bibliographical note 19th Int. Conf. on Atomic Layer Deposition & 6th Int. Atomic Layer Etching Workshop, Bellevue, WA, USA, July 21-24, 2019; paper ALE1-WeM3 (Invited). Document type public lecture Files To receive the publication files, please send an e-mail request to TNO Library.