Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Title

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

 Author

Mione, M.A.
Engeln, R.
Vandalon, V.
Kessels, W.M.M.
Roozeboom, F.

Publication year

2019

 Subject

Industrial Innovation
Atomic layer etching
ALE
Infrared spectroscopy
Atomic layer deposition
Spatial ALD
Etching

 To reference this document use:

http://resolver.tudelft.nl/uuid:bd2cb67d-addc-44da-8f99-fcb28896d6d9

 TNO identifier

868218

 Article number

paper AF1TuM5

 Bibliographical note

19th AVS International Conference on Atomic Layer Deposition & 6th International Atomic Layer Etching Workshop (ALD - ALE 2019), Bellevue, USA, July 21-24 2019

 Document type

public lecture
Files
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