Print Email Facebook Twitter Atomic Layer Etching&Area-Selective Atomic Layer Deposition Title Atomic Layer Etching&Area-Selective Atomic Layer Deposition Author Roozeboom, F. Publication year 2019 Subject Chemistry Physics MaterialsIndustrial InnovationAtomic layer etchingALEAtomic layer depositionALDArea-selective deposition To reference this document use: http://resolver.tudelft.nl/uuid:bb204341-b4c1-4ce6-aa0d-d309fca6a9cc TNO identifier 862234 Bibliographical note Atomic Layer Etching & Area-Selective Atomic Layer Deposition, Swiss-Dutch SEMICON Tech Week, Korea, January 21-25, 2019 (Invited) Document type public lecture Files To receive the publication files, please send an e-mail request to TNO Library.