Title
Developments in plasma enhanced spatial ALD for high throughput applications [3.04]
Author
Creyghton, Y.
Illiberi, A.
Mione, M.
van Boekel, W.
Debernardi, N.
Seitz, M.
van den Bruele, F.
Poodt, P.
Roozeboom, F.
Publication year
2016
Abstract
Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with exceptional dimensional and chemical stability providing flow geometries optimized for efficient radical transport are needed. This paper reports on the initial steps taken to provide and examine the required linear scalable plasma sources. The effectiveness of close-proximity direct and remote plasma sources are demonstrated using thin film deposition of Al2O3 and ZrO2. Paper received the Hans Pulker Award for the best conference paper.
Subject
Nano Technology
TFT - Thin Film Technology
TS - Technical Sciences
Physics
Industrial Innovation
Al2O3
ALD
APP
Atmospheric pressure plasma processes
APP
Atomic layer deposition
ALD
DBD
Dielectric barrier discharge
Non-thermal plasma
Spatial ALD
ZrO2
To reference this document use:
http://resolver.tudelft.nl/uuid:90d9e193-0a6f-496a-b28a-eb5aaa513679
TNO identifier
537669
Source
Proc. Int. Conf. on Coatings on Glass and Plastics (ICCG 2016), Braunschweig, Germany, June 12-16, 2016, 93-97
Document type
conference paper