Print Email Facebook Twitter Developments in plasma enhanced spatial ALD for high throughput applications [3.04] Title Developments in plasma enhanced spatial ALD for high throughput applications [3.04] Author Creyghton, Y. Illiberi, A. Mione, M. van Boekel, W. Debernardi, N. Seitz, M. van den Bruele, F. Poodt, P. Roozeboom, F. Publication year 2016 Abstract Atomic layer deposition by means of spatial separation of reactive gases is emerging as an industrial manufacturing technology. Integration of non-thermal plasma in spatial ALD machines will further expand the process window towards lower operation temperatures and specific materials requiring radicals (O, N, H, OH, NH etc.). Plasma sources with exceptional dimensional and chemical stability providing flow geometries optimized for efficient radical transport are needed. This paper reports on the initial steps taken to provide and examine the required linear scalable plasma sources. The effectiveness of close-proximity direct and remote plasma sources are demonstrated using thin film deposition of Al2O3 and ZrO2. Paper received the Hans Pulker Award for the best conference paper. Subject Nano TechnologyTFT - Thin Film TechnologyTS - Technical SciencesPhysicsIndustrial InnovationAl2O3ALDAPPAtmospheric pressure plasma processesAPPAtomic layer depositionALDDBDDielectric barrier dischargeNon-thermal plasmaSpatial ALDZrO2 To reference this document use: http://resolver.tudelft.nl/uuid:90d9e193-0a6f-496a-b28a-eb5aaa513679 TNO identifier 537669 Source Proc. Int. Conf. on Coatings on Glass and Plastics (ICCG 2016), Braunschweig, Germany, June 12-16, 2016, 93-97 Document type conference paper Files To receive the publication files, please send an e-mail request to TNO Library.