Excellent Passivation of n-Type Silicon Surfaces Enabled by Pulsed-Flow Plasma-Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide

Title

Excellent Passivation of n-Type Silicon Surfaces Enabled by Pulsed-Flow Plasma-Enhanced Chemical Vapor Deposition of Phosphorus Oxide Capped by Aluminum Oxide

Author

Melskens, J.
Theeuwes, R.J.
Black, L.E.
Berghuis, W.J.H.
Macco, B.
Bronsveld, P.C.P.
Kessels, W.M.M.

Publication year

2021

Subject

Aluminum oxide
Chemical vapor deposition
Phosphorus oxide
Silicon
Surface passivation

To reference this document use:

http://resolver.tudelft.nl/uuid:87ccb5ac-047d-4cd2-b81b-37e06181cf64

DOI

https://doi.org/10.1002/pssr.202000399

TNO identifier

957636

Publisher

Wiley

ISSN

1862-6254

Source

Physica Status Solidi - Rapid Research Letters, 15 (15)

Document type

article