Title
On the Growth, Percolation and Wetting of Silver Thin Films Grown by Atmospheric-Plasma Enhanced Spatial Atomic Layer Deposition
Author
Mameli, A.
van den Bruele, F.
Ande, C.K.
Verheijen, M.A.
Kessels, W.M.M.
Roozeboom, F.
Contributor
Roozeboom, F. (editor)
Publication year
2016
Abstract
In this work we studied the deposition of silver (Ag) by spatial-ALD on molybdenum layers serving as a growth model substrate. Mo-layers were selected for testing the suitability of spatial-ALD in fabricating MoO3/Ag/MoO3 tri-layer transparent conductor (TC) stacks used for light-management optimization in organic-based and perovskites solar cells. The presence of native MoO3 on the Mo surface was found to hinder the Ag coalescence. Therefore, an H2/N2 plasma pre-treatment was introduced before Ag deposition in order to reduce the native MoO3. It was concluded that this plasma pre-treatment was effective in promoting Ag wetting, as corroborated by scanning electron microscopy and ellipsometry measurements. Wetting/de-wetting properties as probed by rapid thermal annealing experiments and comparable XRD stress amplitude measurements supported the conclusion that, plasma pre-treatment ALD deposited MoO3 layers can act as wetting layers for subsequent Ag spatial-ALD. This can open up alternative pathways for the fabrication of TCs using ALD.
Subject
Nano Technology
TFT - Thin Film Technology
TS - Technical Sciences
Materials
Industrial Innovation
Deposition
Thin Films
Atmospheric plasma
Atomic layer deposition
ALD
Spatial ALD
Silver
To reference this document use:
http://resolver.tudelft.nl/uuid:850804e6-d8a6-4adf-91f3-dca122c43a1a
DOI
https://doi.org/10.1149/07506.0129ecst
TNO identifier
572953
Source
ECS Transactions, Atomic Layer Deposition Applications 12, PRiME 2016/230th ECS Meeting, October 2, 2016 - October 7, 2016, 75 (6), 129-142
Document type
conference paper